Used AMAT / APPLIED MATERIALS Centura DPS #9301844 for sale
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ID: 9301844
Wafer Size: 12"
Vintage: 2007
Etcher, 12"
PC: IBM 0090-04959 and 0090-04958 Server type
Mainframe: Centura AP
Chamber A: DPS Cerena (High temperature heater)
EDWARDS Turbo pump
Controller: SCV-1500
Gate valve: VAT
RF Generator: ADVANCED ENERGY Apex 1513
KASHIYAMA MU-603X Dry pump
Gases:
MFC No / Make / Gases / SCCM
1 / UNIT INSTRUMENTS / O2 / 20
2 / UNIT INSTRUMENTS / O2 / 200
3 / UNIT INSTRUMENTS / CHF3 / 400
4 / UNIT INSTRUMENTS / He / 400
5 / UNIT INSTRUMENTS / CF4 / 300
6 / UNIT INSTRUMENTS / Ar / 400
7 / UNIT INSTRUMENTS / BCl3 / 400
8 / UNIT INSTRUMENTS / HBr / 500
9 / UNIT INSTRUMENTS / NF3 / 200
10 / UNIT INSTRUMENTS / Cl2 / 200
11 / UNIT INSTRUMENTS / H2 / 400
12 / UNIT INSTRUMENTS / SiCl4 / 70
13 / UNIT INSTRUMENTS / CH4 / 70
14 / UNIT INSTRUMENTS / CH2F2 / 100
15 / UNIT INSTRUMENTS / CO / 100
16 / UNIT INSTRUMENTS / N2 / 100
17 / UNIT INSTRUMENTS / SF6 / 100
19 / UNIT INSTRUMENTS / CH3F / 100
20 / UNIT INSTRUMENTS / HBr / 300
22 / UNIT INSTRUMENTS / CH2F2 / 100
23 / UNIT INSTRUMENTS / O2 / 200
24 / UNIT INSTRUMENTS / CHF3 / 400
FPC / MKS / N2 / 1000
Chamber C: DPS G5
EDWARDS Turbo pump
Controller: SCV-1500
Gate valve: VAT
RF Generator: ADVANCED ENERGY Apex 1513
Dry pump missing
Gases:
MFC No / Make / Gases / SCCM
1 / UNIT INSTRUMENTS / O2 / 20
2 / UNIT INSTRUMENTS / O2 / 200
3 / UNIT INSTRUMENTS / CHF3 / 300
4 / UNIT INSTRUMENTS / He / 400
5 / UNIT INSTRUMENTS / CF4 / 300
6 / UNIT INSTRUMENTS / Ar / 400
7 / UNIT INSTRUMENTS / BCl3 / 400
8 / UNIT INSTRUMENTS / HBr / 500
9 / UNIT INSTRUMENTS / NF3 / 300
10 / UNIT INSTRUMENTS / Cl2 / 200
11 / UNIT INSTRUMENTS / H2 / 200
12 / UNIT INSTRUMENTS / SiCl4 / 70
13 / UNIT INSTRUMENTS / CH4 / 30
14 / UNIT INSTRUMENTS / CH2F2 / 100
15 / UNIT INSTRUMENTS / CO / 100
16 / UNIT INSTRUMENTS / N2 / 100
17 / UNIT INSTRUMENTS / N2 / 200
18 / UNIT INSTRUMENTS / CH3F / 100
19 / UNIT INSTRUMENTS / SF6 / 100
20 / UNIT INSTRUMENTS / HBr / 300
21 / UNIT INSTRUMENTS / CH4 / 30
22 / UNIT INSTRUMENTS / CH2F2 / 100
23 / UNIT INSTRUMENTS / O2 / 200
24 / UNIT INSTRUMENTS / CF4 / 300
FPC / MKS / N2 / 1000
Chamber D: ASP (RF type)
RF Generator: ADVANCED ENERGY
KASHIYAMA MU-603X Dry pump
Gases:
MFC No / Make / Gases / SCCM
37 / UNIT INSTRUMENTS / N2 / 1000
38 / UNIT INSTRUMENTS / N2 / 1000
40 / UNIT INSTRUMENTS / O2 / 10000
Missing parts:
Hard Disk Drive (HDD)
Dry pump
2007 vintage.
AMAT / APPLIED MATERIALS Centura DPS (Dynamic Process Equipment) reactors is a process system used in the fabrication of microelectronic components such as semiconductors, memory chips and microprocessors. The reactor uses a series of industrial-grade materials to create a self-contained environment in which etching, deposition and cleaning of microelectronic feature layers are reliably carried out. The DPS chamber have a wide range of capabilities and are designed for easy configuration for specific projects, offering superb repeatability, uniformity and fault tolerance. In AMAT Centura DPS unit, a high-efficiency, low generating heater is used to create a chamber temperature of up to 250°C. The temperature is important for stripping of resists and photoresist cleaning. The heater includes a forced convection fan to ensure uniform temperature in the chamber and a retractable showering nozzle to evenly spread the heat. In addition, the heater also includes water cooling capability to prevent thermal runaway. A proprietary process chamber aerosol delivery machine is used to control the temperature of the chamber and prevent contamination. The aerosol delivery tool works by separating incoming air into solids and vapors and then control the temperature and humidity of the chamber. It also makes use of a dual-filtering element to ensure the only contaminants entering the chamber are the ones necessary for the process. The robust controller asset is designed for easy use, with a single-dial knob for adjusting both process parameters and chamber conditions. It is capable of controlling parameters including pressure, temperature and humidity in the chamber, as well as a number of other process-specific parameters. The flexibility of the controller model also makes it easy to customize recipes for different application areas and process monitoring during the fabrication process. APPLIED MATERIALS Centura DPS is an important part of the microelectronics fabrication process. It ensures that etching and deposition processes are carried out with precision, while also providing an environment in which resist stripping and cleaning can be safely and efficiently completed. The wide range of capabilities, configurable nature, and integrated control equipment make Centura DPS an excellent choice for microelectronics fabrication.
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