Used AMAT / APPLIED MATERIALS Centura DPS #9314928 for sale

AMAT / APPLIED MATERIALS Centura DPS is a process-oriented rapid thermal reaction equipment used for a variety of applications such as aluminum oxide deposition, amorphous silicon deposition, and other semiconductor processes. It features a horizontally-oriented U-shaped reactor chamber with wafer support inside. The reactor chamber relies on a programmable radiant heating system to provide precise control over the temperature, allowing for a precise and uniform flux of heat energy over the wafer surface. The electrical unit is integrated with a process control box that allows users to easily monitor and adjust parameters such as time, temperature, and oxygen pressure. The machine is designed to provide superior results in terms of low temperature non-invasive thermal reaction processing. Its proprietary diffuse reflector technology allows for a homogeneous temperature profile on the wafer surface, allowing depositions to be run in temperatures as low as 300°C, making it extremely safe for sensitive substrates such as GaAs and SiGe. This low-temperature processing is ideal for growing and maintaining layer uniformity for integrated circuits. Additionally, the tool includes an integrated optical asset for monitoring the thermal deposition process, allowing users to quickly detect any deposition irregularities. AMAT Centura DPS reactor is capable of performing rapid thermal process cycle times as short as 15 seconds with repeatability and stability in the nanometer range. Its patented uniform thermal distribution technology offers excellent precision and repeatability for a wide range of processes, providing superior results for delicate systems. The model also come with a set of procedural validations and technical support tools to ensure quality process results. APPLIED MATERIALS Centura DPS reactor is an ideal choice for semiconductor device fabrication processes, providing superior results in terms of low temperature deposition while maintaining the highest degree of consistency and accuracy. Its low temperature processing capabilities allow manufacturers to perform complex processes while still protecting delicate substrates, while its monitoring and control features allow users to detect and adjust any irregularities quickly and easily.