Used AMAT / APPLIED MATERIALS Centura DPS #9350294 for sale
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ID: 9350294
Wafer Size: 12"
Vintage: 2006
Etchers, 12"
Hard Disk Drive (HDD)
2006 vintage.
AMAT / APPLIED MATERIALS Centura DPS is a state-of-the-art reactor equipment engineered to deliver reliable, high performance, long-term chemical etch solutions. This three-chambered chemical vapor deposition (CVD) reactor is designed to produce ultra-thin films, thick films, uniform films, and controlled film thickness. AMAT Centura DPS system provides a wide range of plasma etching capabilities, and is capable of supporting both chemical dry etch and plasma-enhanced etch processes. The unit is also equipped with an automated process control machine for precise monitoring and repeatable processes. APPLIED MATERIALS Centura DPS is equipped with high performance RF power supplies and plasma excitation electrodes, which provide for accurate control over the etching process, ensuring reliability and uniformity. The reactor is also equipped with an adaptive process control tool that allows for process optimization through computer-controlled process parameters. This asset has an intuitive interface that allows users to quickly set process parameters and adjust them as needed. The process control model also provides an alarm notification feature that monitors any process deviations so corrective action can be taken if required. Centura DPS is a versatile equipment, as it can be used for a variety of applications including advanced dielectric etch, demanding barrier layer etches, as well as high rate copper etches. It is also designed for high throughput and for use with multiple wafers simultaneously, allowing for efficiency and productivity gains. The design of the reactor is optimized for low cost of ownership, with the ability to adjust process conditions on-the-fly and easy clean up and maintenance. The Plasma Enhanced Chemical Vapor Deposition (PECVD) process, coupled with the automated process control, enables production of conformal films with excellent uniformity and reproducibility of etch profiles. Overall, AMAT / APPLIED MATERIALS Centura DPS is a reliable and versatile CVD reactor system that offers users a wide range of plasma etching capabilities, high throughput, and automated process control. This reactor unit is capable of achieving precise, reproducible, and uniform etching results that can be applied to a variety of etching applications.
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