Used AMAT / APPLIED MATERIALS Centura DxL #117144 for sale

Name: AMAT / APPLIED MATERIALS Centura DxL
Brand: AMAT / APPLIED MATERIALS
SKU: 117144
Availability: InStock

URL successfully copied!

Tap to zoom

Photo Used AMAT / APPLIED MATERIALS Centura DxL For Sale

Reactors

Manufacturer

AMAT / APPLIED MATERIALS

Model

Centura DxL

ID: 117144

Wafer Size: 8"

Vintage: 2000

PECVD SiO2 system, 8" Specifications: (3) Chambers: SiO2 Cool down chamber HP robot Notched wafers Gases: Ch A, B, C: SiH4, NF3, N2O, CF4, N2, Ar Front and rear monitors SMC chiller (3) RF generators: ENI OEM 12B (2) EBARA A30W dry pumps (3) EBARA A70W dry pumps Process kits English software All cables and hoses Packing list: Mainframe System controller RF generator rack Rear monitor Rear monitor base Front monitor set Chamber A ceramic shield Chamber A susceptor Chamber A ceramic edge ring Chamber A ceramic hoop (4) Chamber A ceramic lift pins Chamber B ceramic shield Chamber B susceptor Chamber B ceramic edge ring Chamber B ceramic hoop (4) Chamber B ceramic lift pins Chamber C ceramic shield Chamber C susceptor Chamber C ceramic edge ring Chamber C ceramic hoop (4) Chamber C ceramic lift pins Cables 1-12 Water hose Chamber A pump Chamber B pump Chamber C pump T/M pump L/L pump SMC chiller Cables 13-20 Power: 208VAC, 3 phase, 50 / 60 Hz De-installed Q4 2009 Currently warehoused / plastic-wrapped 2000 vintage.

Read More Close

AMAT / APPLIED MATERIALS Centura DxL is a revolutionary semiconductor reactor that offers a versatile, cost-effective solution for micro-electronic device fabrication. It is powered by AMAT proven PECVD platform featuring the Centura XL engineering equipment. With its advanced features, AMAT Centura DxL sets a new standard for ultra-high aspect ratio processing. APPLIED MATERIALS Centura DxL is designed to provide the highest deposition rate and uniformity, maximizing production throughput and yields. Its high-performance PECVD platform operates up to 530°C, allowing for the deposition of a wide range of oxide, nitride, and metal films. The reactor combines APPLIED MATERIALS patented IntelliPath control system with on-board temperature and pressure control, enabling the deposition of films with both uniformity and repeatability. Centura DxL also offers a variety of high-aspect ratio processing options, including planarization and anisotropic patterning. The reactor offers simultaneous and independent control of both process chamber and upper substrate temperature, allowing for precise control of film deposition and planarization. An advanced wafer boat handling unit enables quick, efficient loading and unloading of wafers. AMAT / APPLIED MATERIALS Centura DxL reactor offers advanced features that make it one of the most versatile reactors for micro-electronic device fabrication. It has the capability of depositing a wide range of oxides, nitrides, and metals with extreme accuracy and repeatability. Its high aspect ratio processing capabilities make it the ideal choice for ultra-high aspect ratio applications such as MEMS and nanotechnology. The machine is also easy to use and maintain, with its IntelliPath, on-board temperature and pressure control, and advanced wafer boat handling tool.