Used AMAT / APPLIED MATERIALS Centura DxZ #114611 for sale
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ID: 114611
Wafer Size: 8"
Vintage: 1997
SACVD BPSG system, 8"
4 channel
SMIF (Jenoptik)
Wide body load locks
Manual lid hoist
HP Robot
CH A, B, C, D – SACVD DxZ
Aluminum heater
Direct drive throttle valve
PLIS (Doped)
AE RFG 2000-2V
Gasses (STEC MFCs)
O2 3 SLM
NF3 100 sccm
C2F6 1 SLM
O-zone 10 SLM
N2 5 SLM
He 3 SLM
TEOS
TEB
TEPO
Seriplex Gas Control
CH E – Multi slot cool down
Bottom feed exhaust
Facilities bottom feed
OTF Centerfind
Synergy 452
Radisys AMAT 486
1997 vintage
As-is, where-is.
AMAT / APPLIED MATERIALS Centura DxZ Reactor is a multi-zone thin-film deposition equipment used for manufacturing advanced semiconductor integrated circuits. The reactor is designed to provide high throughput wafer processing, process flexibility, and a high level of precision. The reactor utilizes four electrically independent zones to provide superior system performance and enable wafer process flexibility. Each of the four zones contains a high-temperature, inductively coupled plasma (ICP) sourced from the ICP plasma source. The ICP source allows the reactor to operate at substrate temperatures up to 1000°C, which enables processing of high-temperature metals and alloys. Additionally, the four-zone architecture enables multiple process recipes to be implemented on a single wafer. For example, a single wafer could have four different layers of different materials all processed in the same reactor. AMAT Centura DxZ Reactor features a wafer transport unit that features a high-speed robotic arm. This machine provides superior throughput, precision, and availability, and allows the reactor to process up to 180 wafers per hour. The reactor also features a full suite of process monitoring and control systems, including software control, data logging, and graphics displays. The software allows users to control, monitor, and optimize the reactor's performance throughout the entire process. The reactor is built for exceptional reliability and repeatability. The tool was designed to meet strict safety and environmental standards, with a high level of tolerance to contaminants. Additionally, the reactor utilizes a quality-control asset to ensure the process is reliably repeatable and reproducible. APPLIED MATERIALS Centura DxZ is one of the most advanced thin-film deposition reactors in the market and can enable rapid development and cost-effective production of state-of-the-art semiconductor devices. With its superior throughput, flexibility, reliability, and accuracy, Centura DxZ Reactor is the go-to solution for manufacturers in the semiconductor industry.
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