Used AMAT / APPLIED MATERIALS Centura DxZ #114705 for sale
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ID: 114705
Wafer Size: 8"
Vintage: 1998
TEOS system, 8"
4 channel
Narrow body load locks
Manual lid hoist
HP Robot
CH A, B, C – DxZ PE BSG Oxide
Direct drive throttle valve
AE RFG 2000-2V
Astex Astron remote microwave clean
20torr Baratron
1000torr Baratron
Gases (Unit MFCs):
O2 10 SLM B, C, & D / O2 3 SLM A
NF3 2 SLM
Ar 5 SLM
N2 1 SLM
He 3 SLM
He 10 SLM
STEC LFCs
TEOS
Seriplex Gas Control
CH E – Multi slot cool down
Bottom feed exhaust
Facilities bottom feed
Currently crated (Mainframe, Pump Rack & Cables X2, Heat Exchanger, System controller, Quartz carton)
Warehoused
1998 vintage.
AMAT/AMAT / APPLIED MATERIALS Centura DxZ semiconductor reactor is a deposition and etch reactor designed to provide higher productivity and best-in-class deposition and etch performance. It is capable of handling a variety of advanced processes and applications such as advanced patterning, cleaning, oxidation and nitridation processes, as well as select laser-supported processes. AMAT Centura DxZ features a large chamber size and scalable process capabilities, making it an ideal platform for both existing and new high-throughput production strategies. APPLIED MATERIALS Centura DxZ reactor is powered by a multi-frequency, multi-magnetron RF source and incorporates a range of drive technologies to provide superior process flexibility, enabling operations from ultra-low-pressure deposition to high-density anisotropic etch. It also features a suite of advanced process control and data acquisition systems, giving manufacturers the ability to precisely and efficiently monitor and control their process. The versatility of this APPLIED MATERIALS reactor is due to its patented innovative multi-frequency RF magnetron source which provides full plasma control, independent of other applied frequencies, thereby allowing highly complex, tailored deposition and etching processes. Featuring a patented advanced plasma impedance tuner, it ensures best possible process results utilization. The reactor is designed to fully automate the most challenging plasma processes with embedded process recipes and wafer handling. This capability enables its users to quickly develop and rapidly deploy production process recipes. Furthermore, due to its low-stress processing, it can be used in a wide range of semiconductor geometries including 3D structures, without fear of stress-induced defects. Centura DxZ is a highly-flexible process tool with a wide range of application-specific enhancements such as cluster capability and support for the latest technologies such as advanced patterning and high-k dielectric materials. With its advanced engineering design and a suite of advanced process control and data acquisition systems, it is the ideal platform to support the most challenging designs and technology nodes. AMAT / APPLIED MATERIALS Centura DxZ is designed to maximize productivity and yield, enabling it to fit into a modern manufacturing environment quickly and easily. Its industry-leading process capabilities, levels of automation, and expandable features ensure that manufacturers can quickly and efficiently meet their production goals.
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