Used AMAT / APPLIED MATERIALS Centura DxZ #120819 for sale

Name: AMAT / APPLIED MATERIALS Centura DxZ
Brand: AMAT / APPLIED MATERIALS
SKU: 120819
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Manufacturer

AMAT / APPLIED MATERIALS

Model

Centura DxZ

ID: 120819

CVD system, 8" Specifications: 208 Vac, 4 Wires, 3 phase, 250 A, 50/60 Hz System rating: 90 kVA Platform type: Centura I Body Application: Etch Wafer shape: SNNF Technology: CVD RPS: no (available for additional cost) Chamber type/ location: Position A: DXZ CHAMBER Position B: DXZ CHAMBER Position C: HDP CHAMBER Position D: Blank Position E: Blank Position F: (OA) ORIENTER System safety equipment: CE Mark: No EMO Switch type: Turn to release EMO ETI compliant EMO Guard ring included Smoke detector at controller: Yes Smoke detector at MF No skin: No Smoke detector at gen rack: Yes Smoke detector at AC Rack: Yes Water and smoke detector: Alarm System labels: English CH A: DXZ Chamber: Process Kit: Customer option Baratron guage: 100 Torr/ 10 Torr 　 Match: FIXED MATCH 　 Heater 　　 Lift assembly: 0010-37792 　 Throttle valve: 0090-36296 　 Generator: AE RFG 2000-2V 　　　　 CH B: DXZ Chamber: Process Kit: Customer option 　 Baratron guage: 100 Torr/ 10 Torr 　 Match: FIXED MATCH 　 Heater 　　 Lift Assembly: 0010-37792 　 Throttle valve: 0090-36296 　 Generator: AE RFG 2000-2V 　　　　 CH A: DXZ Chamber: Process Kit: Customer option 　 Baratron guage: 100 Torr/ 10 Torr 　 Match: FIXED MATCH 　 Heater 　　 Lift assembly: 0010-37792 　 Throttle valve: 0090-36296 　 Generator: AE RFG 2000-2V 　　　　 CH F: (OA) orienter: Orienter: Standard 　　　　 Gas delivery options: Component selection: Standard Valve: VERIFLO Transducer 　　 Regulator 　　 Filter 　　 Transducer displays 　　 MFC Type: UNIT UFC-1660 　　　　 Gas panel pallet A Line 1 Gas: C2F6 　 MFC Size: 300 SCCM 　 Line 2 Gas: NH3 　 MFC Size: 1 SLM 　 Line 3 Gas: NH3 　 MFC Size: 100 SCCM 　 Line 4 Gas: N2 　 MFC Size: 325 SCCM 　 Line 5 Gas: H2 　 MFC Size: 5 SLM 　 Line 6 Gas: N2 　 MFC Size: 5 SLM 　 Line 7 Gas: N2O 　 MFC Size: 2 SLM 　 Line 8 Gas: NF3 　 MFC Size: 1SLM 　　　　 Gas Panel Pallet B 　　 Line 1 Gas: C2F6 　 MFC Size: 300 SCCM 　 Line 2 Gas: NH3 　 MFC Size: 1 SLM 　 Line 3 Gas: NH3 　 MFC Size: 100 SCCM 　 Line 4 Gas: N2 　 MFC Size: 325 SCCM 　 Line 5 Gas: H2 　 MFC Size: 5 SLM 　 Line 6 Gas: N2 　 MFC Size: 5 SLM 　 Line 7 Gas: N2O 　 MFC Size: 2 SLM 　 Line 8 Gas: NF3 　 MFC Size: 1SLM 　　　　 Gas Panel Pallet C 　　 Line 1 Gas: C2F6 　 MFC Size: 300 SCCM 　 Line 2 Gas: NH3 　 MFC Size: 1 SLM 　 Line 3 Gas: NH3 　 MFC Size: 100 SCCM 　 Line 4 Gas: N2 　 MFC Size: 325 SCCM 　 Line 5 Gas: H2 　 MFC Size: 5 SLM 　 Line 6 Gas: N2 　 MFC Size: 5 SLM 　 Line 7 Gas: N2O 　 MFC Size: 2 SLM 　 Line 8 Gas: NF3 　 MFC Size: 1SLM 　　　　 General mainframe options: Facilities type: Regulated　 Facilities orientation: FACILITIES BOTTOM CONNECTION 　 Optical character recognition: NO 　 Weight dispersion plates: NONE 　 Service lift: NONE 　　　 Loadlock/Cassette options Loadlock type: NARROWBODY 　 Loadlock platform 　　 Narrow body loadlock extension: NOT APPLICABLE 　 Loadlock options: NONE 　 Cassette Type Supported: STANDARD 　 Loadlock Cover Finish: ANTI-STATIC PAINTED 　 Loadlock Slit Valve Oring Type: KALREZ 　 Wafer Mapping: ENHANCED(O.T.F) 　 Wafer Out of Cassette Sensor: NOT AVAILABLE 　 Cassette Present Sensor: NOT AVAILABLE 　 Integrated Cassette Sensor: YES 　　　　 Transfer Chamber Options: Transfer Ch Manual Lid Hoist: YES 　 Robot Type: CENTURA HP ROBOT 　 Robot Blade Option: AL Blade 　 On the Fly Centerfind: YES 　 Wafer On Blade Detector: BASIC 　 Loadlock Vent: BOTTOM VENT 　 W Throttle Valve and Baratron: NO 　 HP Thruput Enhancement: NO 　 Clear Blank Off Plates: NO 　　　　 Remotes: 　　 Controller Type: 66 INCH COMMON CONTROLLER 　 Cntrlr Electrical Interface: BOTTOM FEED 　 Controller Exhaust: TOP EXHAUST 　 Controller Cover Option: YES 　 Adaptor for SECS Port 25 Pos: NO 　 Exhaust Duct: NO 　 Controller IO Interface: NONE 　 Three Way Switch Box: NO 　　　 AC Rack: Selected Option 　 GFI: 100mA 　 AC Rack Types: 66 INCH Pri/Sec AC GEN RACK 　 Exhaust Collar: NONE 　 Primary MCE AC Rack: NOT APPLICABLE 　 Secondary MCE AC Rack: NOT APPLICABLE 　 Controller Facility Interface: NO UPS 　 MCE Secondary Generator Rack: NOT APPLICABLE 　　　　 Generator rack options　: RF On indicator: YES 　 RF Gen rack plexiglas cover: NO 　 Second RF On indicator: NO 　 Gen rack cooling water: Gen rack water manifold 　 Gen rack manifold facilities: NOT APPLICABLE 　 RF Generator flow meter: NOT AVAILABLE 　　　　 1997 vintage.

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AMAT / APPLIED MATERIALS Centura DxZ is an ultra-large area PECVD (plasma-enhanced chemical vapor deposition) tool designed for large scale applications. AMAT Centura DxZ has a chamber size of 10M x 10M, and is capable of processing substrates as large as 8.2M x 3.2M. It is powered by a custom vacuum-microprocessor control equipment that is capable of creating highly uniform plasma and uniform low-pressure CVD processes. The reactor benefits from a high-density power system and conformal facing plates, providing the ultimate uniformity and flexibility needed for advanced applications. In addition, APPLIED MATERIALS Centura DxZ includes a dual beam optical unit that provides a unique method of adjusting process parameters. This machine offers a more intuitive way of making adjustments from inside the deposition chamber. In terms of substrate compatibility, Centura DxZ provides full compatibility with a wide range of substrates. It is also capable of processing a range of different surface materials, including silicon, silica, and quartz. AMAT / APPLIED MATERIALS Centura DxZ can process substrates of different sizes, with a minimum width of 0.1 of a millimeter and a maximum width of 8.2 meters. In addition, the nucleation stage of the deposition process occurs over a wide range of temperatures, from 100 °C to 600 °C (depending on the application). This makes the deposition process more controllable and less susceptible to potential substrate damage. In terms of materials compatibility, AMAT Centura DxZ offers compatibility with a wide range of materials. It can process materials such as nitrides, borides, nitrides, and amides, as well as a number of organometallic precursors. In addition, it is also capable of handling a variety of etching gases and organometallic precursors. This ensures that the deposition and etching processes can be tailored to meet specific needs. Finally, APPLIED MATERIALS Centura DxZ reactor also offers advanced safety and environmental features. It includes an advanced safety coolant tool to preserve process safety and an optional high-efficiency particulate filtration asset to ensure a clean working environment. The custom process control model also allows for the advanced monitoring of deposition parameters and other process variables. With these features, Centura DxZ is an ideal choice for large scale industrial applications.