Used AMAT / APPLIED MATERIALS Centura DxZ #166624 for sale

AMAT / APPLIED MATERIALS Centura DxZ is a plasma-based etch reactor equipment designed to meet process and production needs related to semiconductor device fabrication. The system is designed to etch through multiple layers of dielectric stack layers and hard budgets, including those made of Nitride, Silicon, and silicon dioxide. The unit is modular and configurable, enabling it to be adapted to a range of process conditions. The reactor enables etching of materials with high accuracy and reliability at the nanometer level. It incorporates advanced plasma source and process control technologies such as two-dimensional rf power "thrusters" and reduced inductive impedance. These technologies enable precision control of etch parameters at the nanometer level. Additionally, a three-dimensional vision machine enables wafer profile metrology, providing real-time closed-loop feedback to the reactor's etch tool. AMAT Centura DxZ is designed to operate with stable etch rates and good repeatability, making it ideal for production applications. Its efficient design ensures high etch rates, low cost of ownership, and process stability. The asset's integrated gas processing model enables optimal utilization of the gases used in the etching process, ensuring high product yield, improved throughput, and low cost of ownership. APPLIED MATERIALS Centura DxZ also incorporates advanced process control algorithms to enable fast and reliable etching of patterns. Centura DxZ incorporates several safety features to protect wafers and personnel from harm. It includes a clamping mechanism to protect the wafers from injury during the etching process, has advanced human-machine interface features to prevent user errors, and an integrated enclosure that contains hazardous substances, emissions, and noise levels. Additionally, the equipment is designed to meet SEMICONDUCTOR EQUIPMENT & MATERIALS INTERNATIONAL (SEMI) standards for environmental, safety and reliability. In summary, AMAT / APPLIED MATERIALS Centura DxZ is an advanced plasma-based etch reactor system designed to meet process and production needs related to semiconductor manufacturing. It incorporates advanced technologies precision control at the nanometer level, ensuring high accuracy and reliability. Plus, the unit is designed with safety features, is efficient and cost-effective, and meets SEMI standards for environmental, safety, and reliability.