Used AMAT / APPLIED MATERIALS Centura DxZ #9046124 for sale
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ID: 9046124
Wafer Size: 8"
Vintage: 1996
(3) chamber CVD system, 8"
Specifications:
Platform type: Centura I Body
SBC Board: V452
Chamber Type:
Position A: DxZ Nitride
Position B: DxZ Nitride
Position C: DxZ Nitride
Position D: Blank
Position E: MULTI COOLDOWN
CH A: DxZ Chamber:
Baratron Guage: 10Torr / 1Torr
Match: AE 3155094-003A
Heater Lift: 0010-38426
RF Generator: RFG 2000-2V
EPD: 0500-01047
Heater Driver: 0190-09419
CH B: DxZ Chamber:
Baratron Guage: 10Torr / 1Torr
Match: AE 3155094-003A
Heater Lift: 0010-38426
RF Generator: RFG 2000-2V
EPD: 0500-01047
Heater Driver 0190-09419
CH C: DxZ Chamber:
Baratron Guage: 10Torr / 1Torr
Match: AE 3155094-003A
Heater Lift: 0010-38426
RF Generator: RFG 2000-2V
EPD:
Heater Driver: 0190-09419
CH E: Cooldown Chamber:
Type: Multi cooldown
Gas Delivery Options:
Component Selection: standard
Valve: Veriflo
Transducer: MKS
Regulator:
Filter:
Transducer Displays:
MFC Type: STEC 4400
Gas Panel: Pallet A:
Pallet
Gas Line Configuration:
Line 1: Gas NH3
MFC Size: 2 SLM
Line 2: Gas N2
MFC Size: 5 SLM
Line 3: Gas SiH4
MFC Size: 200 SCCM
Line 4: Gas NF3
MFC Size: 1 SLM
Line 5: Gas N2O
MFC Size: 1 SLM
Line 6: Gas CF4
MFC Size: 3 SLM
Line 7: Gas N20
MFC Size: 4V 239.7 SCCM / 2V 119.8SCCM
Line 8: Gas N2
MFC Size: 5 SLM
Line 9: Gas HE
MFC Size: 5SLM
Gas Panel: Pallet B:
Pallet:
Gas Line Configuration:
Line 1: Gas NH3
MFC Size: 2 SLM
Line 2: Gas N2
MFC Size: 5SLM
Line 3: Gas SiH4
MFC Size: 200 SCCM
Line 4: Gas NF3
MFC Size: 1 SLM
Line 5: Gas N2O
MFC Size: 1 SLM
Line 6: Gas CF4
MFC Size: 3 SLM
Line 7: Gas N20
MFC Size: 4V 239.7 SCCM / 2V 119.8SCCM
Line 8: Gas N2
MFC Size: 5 SLM
Line 9: Gas HE
MFC Size: 5SLM
Gas Panel: Pallet C:
Pallet:
Gas Line Configuration
Line 1: Gas NH3
MFC Size: 2 SLM
Line 2: Gas N2
MFC Size: 5SLM
Line 3: Gas SiH4
MFC Size: 200 SCCM
Line 4: Gas NF3
MFC Size: 1 SLM
Line 5: Gas N2O
MFC Size: 1 SLM
Line 6: Gas CF4
MFC Size: 3 SLM
Line 7: Gas N20
MFC Size: 4V 239.7 SCCM / 2V 119.8SCCM
Line 8: Gas N2
MFC Size: 5 SLM
Line 9: Gas HE
MFC Size: 5SLM
Transfer Chamber Options:
Transfer Ch Manual Lid Hoist: yes
Robot Type: Centura HP robot
Robot Blade Option: Ceramic Blade
Remotes:
Heat Exchanger: AMAT 0
1996 vintage.
AMAT / APPLIED MATERIALS Centura DxZ Reactor is a single-wafer chemical vapor deposition (CVD) equipment designed to deliver superior deposition quality and extended-tool life operation. The system is designed with a modular concept that allows users to customize the unit based on their production requirements. It features a rotating susceptor platform with independently driven centering and translating stations to ensure uniform wafer-to-wafer placement. It also has a digital temperature control machine with an independent susceptor heating element to enable uniform thermal treatment across the entire wafer. The tool is equipped with an universal multiple showerhead to ensure uniform deposition of unique films along with high throughput. The process chamber is highly vacuum-sealed for contamination-free operations, and a purging asset is included to further reduce contamination. AMAT Centura DxZ is also equipped with a gas panel model for controlling and monitoring process gases to ensure that films are consistently deposited with superior quality. Additionally, an automatic stripping mechanism is included for fast, easy removal of films during repairs, maintenance, and upgrades. With its robust design and reliable performance, APPLIED MATERIALS Centura DxZ Reactor is an ideal choice for CVD applications in semiconductor and MEMS device manufacturing.
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