Used AMAT / APPLIED MATERIALS Centura DxZ #9177323 for sale
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ID: 9177323
Wafer Size: 8"
Chamber, 8"
Wafer shape: SNNF (Semi Notch No Flat)
System configuration:
Chamber B:
Heater: AL
Clean method: RF
Frequency: Dual HF + LF
Manometer: Single 100 torr
Gas delivery:
MFC Type: STEC 4400MC
Valves: FUJIKIN 5 Ra Max
Filters: Millipore
Transducers: MKS with display
Regulators: Veriflo
Single line drop (SLD): No
Liquid delivery type: EPLIS
Injection valve: Yes
LFM TEOS: Yes
Chamber B Model Size
NF3 STEC 4400 300 sccm
C2F6 STEC 4400 2 SLM
O2 SETC 4400 3 SLM
N2 STEC 4400 1 SLM
HE STEC 4400 3 SLM
LFM LF-410A 1.5 g/m
(2) Generators:
HF Generator
LF Generator
Umbilicals:
Signal cable length (S/C ~ MF): 25Ft
RF Gen coax cable length: 50Ft
Pump cable: 50Ft.
AMAT / APPLIED MATERIALS Centura DxZ is a versatile reactor designed for thin film deposition. It uses physical vapor deposition to deposit high-quality thin films, making it ideal for semiconductor/optoelectronic manufacturing as well as other applications. The reactor features a large process chamber to accommodate substrates of various shapes and sizes. It also uses a multi-zone heating equipment, allowing for precise control of thermal energy during the deposition process. The reactor is designed for improved uniformity, allowing for thin films to be applied with demonstrated uniformity across the wafer. The high-performance design also helps to minimise particle ingestion, with an optimised gas flow system to ensure that particles are swept away by air streams and other gases as they emerge from the process. The Centura also features a number of unique features that help minimise susceptibilities and ensure accuracy during thin film deposition. Its high-precision gas valves are designed to regulate the flow of gases accurately, while its high-precision process monitoring systems provide data on process response and performance. Additionally, the unit is equipped with advanced diagnostics and advanced process controller capabilities that allow operators to modify processes as needed to stay on target. The design of AMAT Centura DxZ also allows for a wide range of chemical reactions to be monitored, so that the deposition process can be closely directed and optimized for optimal results. It also has a number of safety features like an inert gas locker and a countdown timer for prevention of over-process. Overall, APPLIED MATERIALS Centura DxZ is an advanced thin film deposition machine that provides reliable and repeatable thin film deposition. It's versatile design allows for accurate and uniform coating, with a strong focus on reliability, safety and repeatability. By combining advanced features and processes, the Centura ensures thin films are applied with precision and high yields.
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