Used AMAT / APPLIED MATERIALS Centura DxZ #9193775 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

ID: 9193775
DCVD System Voltage: 208 VAC Phase: 30’’ (4) Wires Full-load current: 240A Frequency: 60Hz Maximum system rating: 87KVA Ampere rating of largest load: 140A Interrupting current: 10,000 Chamber A: TEOS, He, O2, N2, NF3, Ar Chamber B: a-Si, SiO, SiON, SIN (SiH4, N2O, H2, He, N2, NH3, NF3, Ar) Chamber C: a-Si, SiO, SiN (SiH4, N2O, H2, He, N2, NH3, PH3/H2, NF3, Ar) Chamber D: SiO, SiON (SiH4, N2O, H2, He, N2, NH3, NF3, Ar).
AMAT / APPLIED MATERIALS Centura DxZ Reactor is designed for high-performance process chemistry and physical vapor deposition (PVD) of advanced materials. The DxZ is a fully automated high-precision process tool designed for the rapid and reliable production of advanced film structures. It is engineered with a high degree of up-time and qualified to meet the most demanding environmental, operating, and process conditions. The DxZ Reactor is equipped with an advanced MFC Mass Flow controller that is capable of precise process control and features a unique "zone-by-zone" control equipment. This feature helps to control the spread of reactant gas concentrations across the reactor volume and reduce the risk of process drift. Additionally, the DxZ has a large capacity multi-zone gas system which helps improve process repeatability and reduces the risk of drift. The Process Cladding Plasma Source (PCPS) provides uniform ICP (Inductively Coupled Plasma) inputs to the processing chamber with high-efficiency and process uniformity. The PCPS operates with a smart power supply to ensure pulse-peak stability and smooth plasma profiles for optimized process stability and repeatability. The DxZ Reactor is designed for robust operation in the cleanroom environment and is equipped with the latest cleanroom-compliant automation and software. The fully automatic load lock unit is designed for minimal process interruption and is equipped with a lamp-lit interior for reduced contamination. The DxZ has an advanced load history logging capability to track and document accurate process information for robust traceability and process history. A specialized environment control machine provides a cleanroom-compliant atmosphere for reliable, repeatable, and uniform layer deposition. AMAT Centura DxZ has a wide range of advanced process capabilities, including wafer bonding, uni-directional sputter deposition, alloy deposition, ALD (Atomic Layer Deposition), and IPVD (Inner Plasma Vapor Deposition). This tool is capable of processing a wide variety of specialty materials, making it ideal for fabricating complex high-performance devices. Additionally, the DxZ has flexible operations modes, allowing users to customize their process parameters for the best performance results. APPLIED MATERIALS Centura DxZ Reactor is designed for high-performance, high-efficiency processing of a wide variety of advanced materials. It is equipped with a comprehensive safety and process control tool to ensure reliable process performance. The DxZ is a powerful tool for processing highly specialized materials, making it an ideal choice for advanced manufacturing applications.
There are no reviews yet