Used AMAT / APPLIED MATERIALS Centura DxZ #9230376 for sale

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ID: 9230376
Wafer Size: 8"
Vintage: 1996
CVD System, 8" (3) Chambers: DxZ Chamber A: Manometer: 100/2 Heater: AL Clean method: AE 2000-2V Pressure method: Direct drive throttle valve Chamber B: Manometer:100/2 Heater: AL Clean method: AE 2000-2V Pressure method: Direct drive throttle valve Chamber D: Manometer:100/2 Heater: AL Clean method: AE 2000-2V Pressure method: Direct drive throttle valve 1st Monitor: Through the wall 2nd Monitor: Stand alone Narrow body loadlock HP Robot OTF Valves: Unit MFCs Filters: MILIPORE Regulators: VERIFLO System cabinet exhaust: Top Single line drop Gas pallet configuration: Chamber A / Size / Model SiH4 / 500 sccm / Stec MFCs NH3 / 200 sccm / Unit MFCs NF3 / 1 Slm / Unit MFCs N2O / 500 sccm / Unit MFCs N2 / 5 Slm / Unit MFCs Chamber B / Size / Model SiH4 / 500 sccm / Stec MFCs NH3 / 200 sccm / Unit MFCs NF3 / 2 Slm / Unit MFCs N2O / 500 sccm / Unit MFCs N2 / 5 Slm / Unit MFCs Chamber D / Size / Model SiH4 / 500 sccm / Stec MFCs NH3 / 200 sccm / Unit MFCs NF3 / 1 Slm / Unit MFCs N2O / 500 sccm / Unit MFCs N2 / 5 Slm / Unit MFCs Process: Nitride deposition (Nit. Pass.) 1996 vintage.
AMAT / APPLIED MATERIALS Centura DxZ Reactor is a production-level batch reactor, capable of producing high-performance materials for a variety of applications. The DxZ Reactor is uniquely designed for the production of plasma enhanced chemical vapor deposition (PE-CVD). The DxZ reactor is designed with a turntable base and a 4-segment multi-targeted plasma. This allows the equipment to synthesize a variety of materials such as nitride, oxide, diamond-like carbon (DLC), and silicon-based compounds that can be tailored to specific applications. The turntable is also used to switch between different targets, allowing for wear-resistant multi-segment targets. In operation, the DxZ reactor uses a three-stage process. The first stage is gas introduction, where gases enter the chamber and are mixed appropriately for synthesis. In the second stage, the pulsed plasma is generated and maintained by a power system that supplies power matched to the process. Finally, in the third stage, a substrate is placed in the chamber, and the reactive species formed from the mix of high frequency electric fields and gases are deposited onto the substrate to form the material. The DxZ reactor also has multiple safety features to ensure reliable operation. These include safety interlocks and pressure sensors for the gas inlet unit and a gas exhaust machine with an adjustable timer, as well as high efficiency particulate and noxious gas filtration. Thanks to its design and features, the Corning AMAT Centura DxZ Reactor is an excellent tool for producing high-quality, high-performance materials. Its robust design, safety features and multiple substrate materials makes it a great choice for commercial, industrial and research applications.
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