Used AMAT / APPLIED MATERIALS Centura eMax CT+ #293624199 for sale

AMAT / APPLIED MATERIALS Centura eMax CT+ is a high throughput reactor that can provide uniform and repeatable results with low fabrication cost. It is designed for deposition performance of high temperature films, oxides, nitrides, nitrosyl and polymers. The reactor is composed of 2-5 process pockets depending on configuration, and comes with a focus ion beam (FIB) source and e-beam gun for secondary processes. AMAT Centura eMax CT+ is manufactured with an advanced thermal effusion source. This provides the highly uniform deposition of films over large wafer sizes with exceptional wafer-to-wafer repeatability. The eMax CT+ also allows for variable vacuum pressures and temperature settings, allowing for precise control over the deposition rates, thicknesses, and stoichiometries of the films. This process control can be further optimized with the universal process module, which comes standard with the reactor. APPLIED MATERIALS CENTURA E-MAX CT+ contains a high powered FIB source, providing precise manipulation of the material surface under the microscope. With this source, advanced pattern processing can occur with a high level of accuracy. Furthermore, the e-beam gun allows for nanoscale control of film processes. The reactor's advanced technology can be used to rapid process a number of substrates in production level processing. It is capable of high throughput wafer processing with uniform and repeatable results. AMAT / APPLIED MATERIALS CENTURA E-MAX CT+ is built to provide reliable wafer quality, optimal repeatability and reliability, and low cost of ownership throughout the process.