Used AMAT / APPLIED MATERIALS Centura eMax CT+ #9115996 for sale

AMAT / APPLIED MATERIALS Centura eMax CT+ is a chemical vapor deposition (CVD) reactor used for advanced epitaxial growth and deposition of thin films and nanomaterials. This CVD reactor features a process chamber with an extended active volume and a large radius annulus. It offers high-precision temperature and gas flow uniformity, advanced susceptor design, and a high-purity process environment, making it the ideal choice for challenging deposition challenges. AMAT Centura eMax CT+ is a state-of-the-art CVD reactor designed for high-performance applications. Its large active volume and annulus radius make it ideal for multi-zone growth and advanced epitaxial deposition processes, such as the deposition of nanomaterials and other materials requiring high aspect ratio and step height control. The reactor also offers advanced control of gas flows and temperatures on the wafer to provide uniformity and accuracy. The reactor is powered by an advanced touch-screen user interface that provides easy access to the process parameters, recipes, and process data. It also features integrated pressure and crucible temperature controllers for setpoint control, low pressure sensors for optimum process control, and advanced monitor and protection features for safe process operation. The user interface also allows for real-time monitoring of the chamber's environment, making it easy to adjust or maintain process conditions as needed. The reactor offers extensive temperature control of the process environment, with a range of up to 1200°C. Additionally, its high uniformity over the wafer provides excellent starting and peak temperatures with low temperature ripples across the entire wafer. Its optional susceptor lift-off feature also allows for controlled thermal expansion of the wafer during deposition processes. The reactor also features a compact size and low power consumption to make installation and operation easier and more efficient. It is designed for efficient use of resources, and can also be operated remotely using a laptop or mobile device for increased flexibility and productivity. Additionally, its reduced footprint reduces the need for large processing areas, further increasing space and cost savings. APPLIED MATERIALS CENTURA E-MAX CT+ is engineered to tackle challenging deposition challenges while providing a safe, reliable and efficient experience. Its advanced design and features make it a cost-effective and user-friendly choice for a wide range of semiconductor fabrication processes.