Used AMAT / APPLIED MATERIALS Centura eMax CT+ #9293616 for sale

AMAT / APPLIED MATERIALS Centura eMax CT+ Reactor is a wafer fabrication system used to etch semiconductor wafers using Chemical Vapor Deposition (CVD). The reactor has a small, modular design, making it well suited to the cleanroom environment and is capable of etching all types of materials. AMAT Centura eMax CT+ offers a high degree of precision and control, allowing it to accurately etch materials down to the atomic level. The system features a deposition chamber, a reactant delivery module, and a robot arm. The deposition chamber houses the wafer, and the robot arm is used to move the wafer in a continuous motion as it is etched. The reactant delivery module is where the reactants may be introduced into the deposition chamber. The reactants are generally gases, such as silane, ammonia, and acetylene, and the rate of introduction is controlled by a mass flow controller (MFC). The MFC ensures that the reactants are introduced into the chamber at a safe and even rate, preventing unwanted reactions from occurring. The deposition chamber also houses a specially designed electrode assembly for conducting plasma enhanced CVD processes. This assembly consists of a lower electrode, which is connected to the reactor body and a vertical spinning plasma jet that is responsible for generating the plasma. The plasma jet ensures that the reactants are broken down into smaller molecules and then deposited onto the wafer's surface. APPLIED MATERIALS CENTURA E-MAX CT+ is able to rapidly etch wafers through a horizontal rotating etch chamber with a high degree of accuracy and control. The chamber consists of an upper and lower platen, and the wafer is placed between the two. The upper platen is moved in a continuous motion as the lower platen is independently controlled, allowing the desired etch pattern to be achieved. In addition, APPLIED MATERIALS Centura eMax CT+ is capable of operating multiple reactors in parallel for larger production operations. Each reactor is connected to the same power supply and shared resources, increasing processing speed and efficiency. AMAT / APPLIED MATERIALS CENTURA E-MAX CT+ reactor offers a wide range of functions, allowing it to etch most materials with precision and accuracy. It is a perfect choice for the production of high-performance semiconductor wafers.