Used AMAT / APPLIED MATERIALS Centura eMax CT+ #9352627 for sale

ID: 9352627
Wafer Size: 12"
Vintage: 2004
Etcher, 12" 2004 vintage.
AMAT / APPLIED MATERIALS Centura eMax CT+ Reactor is a high-performance, advanced etching and deposition tool for the fabrication of integrated circuits and other advanced electronic devices. This tool combines a standard cluster tool with an integrated MaxJET™ IIXE Beam Element Technology (BET) source to provide an advanced etch and deposition process. The reactor is used in semiconductor fabrication to accurately deposit or etch materials. It uses a MaxJET™ IIXE BET source to deliver the material to the wafer, which is then driven from the deposition or etching chamber by a computer-controlled, high-speed jet stream. The jet stream provides precise and uniform transport of the material to the substrate. The eMax CT+ also utilizes a Process Digital Magnetic Planar Control (MPC) equipment to precisely control etch parameters. This system grants complete control over the etch process to achieve the highest levels of precision and repeatability. The eMax CT+ includes a standard cluster tool which includes advanced features such as source alignment, hot-punching and portioning, a vision unit for wafer placement, secure data transport, and automated process optimization. The cluster tool ensures repeatable and robust processing while the visual inspection delivers higher yields and throughput. In addition, the reactor is equipped with a range of measurement and control systems to ensure accuracy and performance. This includes an optical diagnostics machine that monitors process parameters such as chamber pressure, gas flow, temperatures, surface topology, and gas composition to ensure optimal operation. AMAT Centura eMax CT+ Reactor is a reliable, high-performance tool for producing advanced and precise features on integrated circuits and other semiconductor devices. It utilizes an integrated MaxJET™ IIXE BET tool, a Process Digital MPC asset, and a range of measurement and control systems to ensure precise and repeatable etching and depositing processes. The reactor is perfect for the fabrication of integrated circuits, electronic devices, and other advanced devices.
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