Used AMAT / APPLIED MATERIALS Centura eMax #9227021 for sale

AMAT / APPLIED MATERIALS Centura eMax reactor is a highly advanced semiconductor reactor that provides critical chip etching technology necessary for the manufacturing of advanced lithography systems. This reactor is designed to enable precise micro-machining with extreme accuracy and high stability to meet the demands of demanding semiconductor processes. At the heart of AMAT Centura eMax reactor is an advanced etching chamber, constructed with advanced fused silica materials. The chamber provides superior thermal stability and excellent environmental control in a variety of manufacturing conditions. The chamber is maintained at a temperature of up to 300 °C, which helps to increase process speed. Additionally, a straightforward design ensures rapid reaction time, helping to reduce error and increase yields. The chamber is also equipped with a unique CCD imaging system, which allows for quick and accurate alignment of the process chamber. This helps to ensure optimal substrate alignment, leading to higher yields and fewer substrate defects. A unique Photon Etch Pulse System is included to further enhance accuracy and speed of the lithography process. This system helps to improve the uniformity of the etching process. The heated etching chamber is powered by an advanced magnetron which provides high levels of precision and repeatability. This highly controlled environment helps to reduce process related variability and lower costs, while maintaining the highest possible yields. An extensive library of recipes, this using APPLIED MATERIALS Centura eMax reactor can easily be tailored to meet a wide range of device demands, such as high aspect ratio structures, low voltage process management, and high speed etching. The reactor also incorporates a number of safety features, including active cooling walls, thermal shutoff, and fail-safe verification lockouts. All of these features combine to ensure a safe and reliable lithography process. For improved convenience, the reactor also features remote monitoring capabilities, which allow for real-time remote updates of the process. In summation, Centura eMax reactor is an advanced etching and lithography tool that provides superior levels of repeatability and accuracy for advanced semiconductor manufacturing processes. This state-of-the-art equipment is capable of meeting the most demanding of process requirements, while providing users with peace of mind and total control of the process from start to finish.