Used AMAT / APPLIED MATERIALS Centura eMax #9239957 for sale

AMAT / APPLIED MATERIALS Centura eMax is an advanced modular reactor developed to facilitate advanced and reliable semiconductor processing at the extreme ultraviolet (EUV) frequency. Unlike other production reactors, AMAT Centura eMax features two completely independent chambers with separate sources, providing a low-cost approach to process optimization with twice the power. The dual 6 kW sources are ideal for manufacturing processes requiring twice the throughput while maintaining high precision, such as photoresist stripping, deposition, and etching. APPLIED MATERIALS Centura eMax features proprietary anti-reflective coatings to yield precise patterning and feature control, allowing for greater control over the design process. The reactor also is equipped with an adjustable pressure system that offers precise processing for cost-effective etching of fragile materials. With its ability to reduce nano-shorts, Centura eMax has been used for fin-height optimization in advanced EUV lithography. The system's compact size offers an efficient use of space, allowing for installation in tight fabrication locations. As an optimal tool for production processes using EUV, it boasts a fast scan rate and a high-energy beam capable of precision etching through hard-to-etch layers. The maximum scan rate of 500 sq cm per minute enables quick process tuning and throughput increases by reducing cycle times. An advanced process controller works in tandem with the man-machine interface to offer easy setup and control of the reactor with quick parameter adjustments. The user-friendly interface allows for increased accuracy in controlling process parameters such as etch rates, deposition rates, and film profiles. Particularly effective for batch EUV processing, the system offers repeatability and reliable, high-yield production runs. Combining EUV performance, advanced process control capabilities, and a small footprint, AMAT / APPLIED MATERIALS Centura eMax is a pioneering production reactor solution for demanding semiconductor processes. The innovative design provides the speed, flexibility and precision for high-volume fabrication and performance optimization.