Used AMAT / APPLIED MATERIALS Centura eMax #9255699 for sale

AMAT / APPLIED MATERIALS Centura eMax is an advanced deposition equipment for physical vapor deposition (PVD) and chemical vapor deposition (CVD) of thin films, including copper. AMAT Centura eMax reactor is designed for high-volume manufacturing of integrated circuits (ICs), thin-film optical devices, magnetic sensors, MEMS components, and other advanced thin-film structures. The eMax reactor features robust, reliable design, high productivity, and improved wafer-to-wafer handling with low-maintenance cost. APPLIED MATERIALS Centura eMax is an automated and capable of multi-target sputtering system designed for the deposition of metal thin films. It is the most advanced and efficient thin film process tool available in the market today. With its high sputter rate (up to 70 ㎡/min), high uniformity, and low operating cost, the eMax is ideal for the production of high quality microelectronics. The unit is configurable with a variety of sputtering targets, and can sputter materials such as copper, aluminum, titanium, and tungsten. Centura eMax's process control machine is based on a closed-loop, automated design. The tool utilizes an in-process control asset to monitor the film deposition process and to ensure that each wafer has the proper layer thickness, uniformity, and structural integrity. The deposition process can be configured to take advantage of improvements in run-to-run uniformity. The model also has the capability to perform diagnostic tests and monitor tool performance. The equipment can provide superior deposition quality and throughput over traditional single-target PVD chambers. The eMax can process a wide variety of substrates, including silicon or gallium arsenide substrates as thin as 0.033mm. The system features a double-vacuum chamber with loadlock, a wafer-handling robot, a gas delivery unit, and various target materials. The machine is also adaptable to new process options, such as copper deposition processes. AMAT / APPLIED MATERIALS Centura eMax is a versatile thin film deposition tool that can accommodate numerous applications. Its high throughput and automated operation make it an ideal tool for mass production of complex thin-film devices. Its modular design allows for customization for specific processes and for easily programing automated sequences for varying process conditions. This versatility, combined with its improved wafer-to-wafer handling, makes the eMax reactor ideally suited for high-volume production of integrated circuits and other advanced thin film devices.