Used AMAT / APPLIED MATERIALS Centura eMax #9260048 for sale

AMAT / APPLIED MATERIALS Centura eMax is an upgraded version of the Centura series of advanced etch and deposition reactors used in the manufacturing of integrated circuits (ICs). It is an industry-leading equipment specifically designed to deliver superior device performance and process control. The system is equipped with a 10 plate, single chamber source configuration. This configuration enables higher throughput, improved productivity, and greater flexibility in etching and deposition processes. With its active gas distribution technology, an array of plasma sources and a proprietary RF unit, the machine efficiently controls the etching and deposition process. The tool is paired with an integrated advanced process monitor that offers users an improved ability to target desired process outcomes. It is also equipped with built-in cleaning capabilities and an automated tunable filter that helps users optimize the deposition process. The asset utilizes a uniform material distribution across the substrate - eliminating the need for manual intervention during fabrication. This greatly simplifies the process and reduces the potential for human error. AMAT Centura eMax is also equipped with an advanced temperature control model that helps users maintain a stable temperature during the etching process. This ensures that the multiple layers of the IC substrate are etched with the same precision, resulting in a uniform layer-by-layer thickness. The equipment is also optimized for speed and throughput, allowing users to produce ICs with maximum efficiency. This is facilitated by the use of vertical integration and a compact factor design. In addition to its advanced technology, APPLIED MATERIALS Centura eMax is user-friendly - allowing users to easily manage and monitor the system. Its user interface includes intuitive visual cues and interactive workflows that simplify process management and reduce the potential for errors. Overall, Centura eMax is an industry-leading advanced etch and deposition reactor designed to deliver superior device performance and process control. It is optimized for speed, throughput, and accuracy, enabling users to fabricate high quality ICs with maximum efficiency.