Used AMAT / APPLIED MATERIALS Centura eMxP+ #9248728 for sale

AMAT / APPLIED MATERIALS Centura eMxP+ reactor is a critical tool used in the semiconductor fabrication process. It is a plasma-enhanced chemical vapor deposition (PECVD) equipment that provides high deposition rates and excellent uniformity for etch and oxynitride applications. The eMxP+ features a 400 mm diameter processing chamber, allowing for larger substrates and higher throughputs than conventional reactors. Its unique chamber/rod design helps provide precise control over the deposition environment and process. The eMxP+ also uses an advanced quaternary RF power combiner, allowing up to three process gases to be used in any combination. This allows for better control and handling of the deposition. The eMxP+ also utilizes the latest RF power generator technology for higher power delivery and maximum temperature uniformity in all applications. The eMxP+ is engineered for uniformity and repeatability. It features a separate static wafer-warming system to ensure uniform pre-treatment temperatures, minimizes the potential of particle contamination from the substrate holder. The substrate cooling unit helps minimize process variation and maintains consistent results. The eMxP+ is also equipped with a control machine with temperature and deposition profile feedback for precise temperature and deposition control with maximum uniformity. The eMxP+ offers the highest level of process flexibility. With its unique dual light pipe design, the eMxP+ is capable of performing the fastest ramp-downs and ramp-ups possible, allowing users to meet process requirements. Its high deposition throughput and uniformity due to its chamber design is ideal for high productivity applications. In addition to its features, AMAT Centura eMxP+ has built-in safety and environmental protection. Its heat sinks and shields on the interior and exterior parts of the tool help reduce heat transfer into the room and provides a safer work environment. Its IED-compliant cooling asset minimizes wasteful gas dissipation, while also lowering the possibility of sample contamination. APPLIED MATERIALS Centura eMxP+ is a powerful and efficient reactor designed for high-productivity semiconductor fabrication applications. Running up to three process gases in any combination and featuring a 400 mm diameter processing chamber, the eMxP+ offers highest levels of deposition uniformity and repeatability. With its advanced heating and cooling systems, it provides maximum temperature uniformity and process flexibility. It also has built-in safety and environmental protection for a safer working environment.