Used AMAT / APPLIED MATERIALS Centura Epi #9053770 for sale

AMAT / APPLIED MATERIALS Centura Epi Equipment is a type of reactor used in the formation of thin films and epitaxial layers. This system is a highly compact, integrated chemical vapor deposition (CVD) chamber with a patented auto-loading mechanism. The unit is designed to offer fast, reliable processing of various materials, such as optical, photovoltaic and organic semiconductor materials, with precision and repeatability. AMAT Centura Epi Machine is designed to be an advanced, multifunctional tool for processing a wide range of materials under CVD conditions. This asset is based on robust and reliable mechanical designs, with easy integration of individual components into automated production processes. The model's modular design provides flexibility and scalability for meeting processing needs in changing production environments. APPLIED MATERIALS Centura Epi Equipment is constructed using stainless steel and ceramic components that are resistant to corrosion, temperature shock and wear. The system is designed for high temperature and high pressure processing capabilities for a wide range of materials and material combinations. The unit also features a low-cost flexible chamber design that enables the deposition of many different layers or materials. Centura Epi Machine features several key components include a modular two-zone vessel, a gas supply module, a power conditioning unit, a vacuum pump and an integrated controller. The two-zone vessel is an advanced, hermetically sealed chamber that transmits temperature and pressure uniformity to the material surfaces. The gas supply module supplies heated or cooled process gas and allows rapid process changes and rapid gas switching. The integrated controller is intuitive yet powerful and can be programmed to automate multiple process steps. In addition, AMAT / APPLIED MATERIALS Centura Epi Tool also offers advanced process control functions, including real-time pressure and temperature control and multi-parameter process monitoring and control. The asset also offers a range of process options, such as nitride and low pressure chemical vapor deposition (LPCVD), for optimum film formation and control. AMAT Centura Epi Model is a highly advanced and versatile tool for forming thin films and epitaxial layers. This equipment offers fast, reliable processing of a wide range of materials and a low-cost flexible design for adapting to changing production requirements. It is also designed with advanced process control and monitoring capabilities to ensure repeatable and consistent performance.