Used AMAT / APPLIED MATERIALS Centura Epi #9153809 for sale

AMAT / APPLIED MATERIALS Centura Epi is a high-performance, low-cost epitaxial reactor designed for advanced semiconductor devices. It utilizes an advanced electropolishing dielectric technology to provide the user with cost-effective solutions for producing ultra-high-frequency and power devices. AMAT Centura Epi can be utilized for both GaAs and silicon epitaxial deposition processes, as well as oxide deposition and diffusion annealing processes. It has a split susceptor design, with a split-ring and swiveling table, as well as multiple gas inlet and outlet ports. This allows for independent operation of multiple processes, with an oxygen enrichment option for performing wafer-to-wafer oxidation. APPLIED MATERIALS Centura Epi is designed for maximum productivity, with high-speed dielectric capability and dual magnetron heads for efficient deposition of layered structures. It has a high-resolution shutter assembly that provides precise control of deposition parameters. It also has air-cooled and water-cooled electrodes, as well as a wide range of chamber and coil components to accommodate process requirements. Centura Epi reactor is a highly stable system, with a low frequency heating rate to ensure a uniform film thickness. Its compact design allows it to fit into tight spaces, while advanced vacuum control provides optimized process conditions. The reactor also features precise temperature control with a high-precision resistance temperature detector. The system is stable over long-term operations and is capable of operating in a wide range of processing conditions. AMAT / APPLIED MATERIALS Centura Epi reactor is also capable of process recovery and in situ deposition of complex structures for extremely precise results. It is designed to provide excellent product performance and environmental reliability, making it an ideal choice for advanced semiconductor device production. The system is designed for precise control of critical parameters and offers unparalleled performance for the most advanced semiconductor processes.