Used AMAT / APPLIED MATERIALS Centura Epi #9155788 for sale

AMAT / APPLIED MATERIALS Centura Epi is a state-of-the-art epitaxy reactor designed for superior wafer-to-wafer consistency and superior uniformity. It is one of the most applicable and versatile epitaxy reactor for the fabrication of compound semiconductor devices and materials. AMAT Centura Epi reactor is designed to be highly reliable, producing uniform and consistently uniform epitaxy films over a wide range of temperatures and process conditions. The main components of APPLIED MATERIALS Centura Epi reactor equipment include a substrate wafer, an epi chamber and the associated process chamber, where the complete epitaxy process takes place. The substrate wafer is suspended and heated within the epi chamber in a heated vacuum environment. The process chamber utilizes multiple shower heads and a furnace provide uniform gas and gas mixing, followed by stepwise effusion of the required material combinations to form an epitaxial layer on the substrate wafer. Centura Epi process is capable of precisely controlling wafer temperature and epitaxial growth rate (EBR) over a wide range of conditions, thus ensuring film uniformity and the highest quality of epitaxial films. Additionally, AMAT / APPLIED MATERIALS Centura Epi reactor system offers superior wafer-to-wafer consistency, safeguarded through advanced temperature control, accurate gas mixing and product traceability. In order for the unit to work optimally, AMAT Centura Epi reactor is designed with a set of advanced optics, i.e., an oven, infrared imaging machine, and CCD imaging tool. The oven is equipped with a high-temperature quartz crystal window for direct observation of the epitaxial growth process. The infrared imaging asset allows for accurate monitoring of the substrate temperature, while the CCD imaging model is used to record the active epitaxial growth process. The temperature of APPLIED MATERIALS Centura Epi chamber can be monitored and controlled remotely or manually, with a programmable set of temperature set points. Temperature stability of the equipment is further improved through the addition of a heating element that is able to maintain the temperature of the epi chamber even during rapid changes in growth conditions (e.g. sudden increases in temperature). Overall, Centura Epi reactor is a versatile and highly reliable epitaxy system, capable of producing superior quality epitaxial films with superior uniformity and wafer-to-wafer consistency. With its advanced optics, temperature control, and process flexibility, AMAT / APPLIED MATERIALS Centura Epi reactor is widely accepted as an industry standard for high-performance epitaxial films.