Used AMAT / APPLIED MATERIALS Centura Epi #9211674 for sale

AMAT / APPLIED MATERIALS Centura Epi reactor is a custom-designed and highly-customizable epitaxial growth tool capable of producing high-quality, homogenous thin films at production-scale. Specifically designed for integrated circuit (IC) manufacturers, this tool offers precise, precise film thickness and uniformity from wafer-to-wafer and within each wafer. The main purpose of this tool is to create a better substrate for improved device performance and manufacturability. AMAT Centura Epi reactor is an evolutionary process for growing high-quality thin-film layers on semiconductor substrates. It features a dual-substrate deposition chamber with high-density plasma sources and a single wafer system. This tool has revolutionized epi growth as it can be operated on both 450mm and 300mm wafers and is capable of achieving higher throughput than ever before. The chamber is well-insulated and equipped with digital controllers and video monitors to monitor process results in real-time. This reactor features multiple top-of-the-line sources, including RF and DC bias sources, with the ability to automatically adjust the temperature and pressure between each deposition cycle. It also includes a patented substrate holder design to facilitate smooth, uniform sputtering deposition that yields consistent film thickness and composition. Additionally, APPLIED MATERIALS Centura Epi provides such precise control over the thermodynamic and kinetic parameters that can affect wafer quality, that it can produce robust and reproducible high-performance epi wafers even in extreme wafer sizes or challenging process conditions. Centura Epi is ideal for producing thin-film layers on substrates for IC fabrication processes. With its innovative design and ability to be easily configured to satisfy the production needs of IC manufacturers, it offers the latest in epitaxial technology for producers to deliver excellent substrate performance. AMAT / APPLIED MATERIALS Centura Epi can be used for a diverse range of applications, including but not limited to, MOSFET fabrication, low-leakage transistors, and high-speed interconnects. It offers an effective solution for creating resilient and reliable substrates for ICs, allowing ICs to operate in high-temperature and high-pressure environments.