Used AMAT / APPLIED MATERIALS Centura Epi #9229958 for sale

AMAT / APPLIED MATERIALS Centura Epi reactor is a versatile next-generation Plasma-Enhanced Chemical Vapor Deposition (PECVD) machine for epitaxial growth of thin-film semiconductors. The equipment is optimized to provide optimal uniformity, high-throughput and advanced process capabilities to meet demanding semiconductor device applications. AMAT Centura Epi utilizes a two-zone architecture that incorporates both PECVD and Edge-graded PECVD (EG-PECVD) processes for quality deposition of thin-film semiconductor materials. The system features a split-interactive chamber design that ensures efficient vapor transport and placement of material to the wafer surface. This coupled with the chamber's low-pressure operation delivers repeatable results with low stress levels and minimized non-uniformities. APPLIED MATERIALS Centura Epi is capable of processing a range of materials, including silicon, silicon-germanium, and complex III-V compounds. Additionally, the reactor has the ability to perform processes such as diode gap filling, ion implantation, and electrode deposition. The unit is designed to deliver the high purity, uniformity, and advanced process capabilities required for the latest semiconductor device applications. Centura Epi reactor is well-suited for a variety of collaborations between multiple companies. It offers a high level of specialization and flexibility, enabling a wide range of users to build their own unique processes for large-scale production. The user also has the capability to fully customize their process parameters. Finally, the machine comes with advanced process control systems that monitor the process performance and ensure consistent product quality. It also offers a wide range of integrated diagnostics, including detailed real-time profile measurement and temperature mapping. This helps streamline the production process and advance productivity.