Used AMAT / APPLIED MATERIALS Centura Epi #9236844 for sale

AMAT / APPLIED MATERIALS Centura Epi is a type of an epitaxial reactor designed to produce epitaxial layers of materials on a substrate. The epitaxial layers fabricated with AMAT Centura Epi equipment offer superior performance characteristics over those achieved through other deposition methods such as chemical vapor deposition (CVD) and physical vapor deposition (PVD). This system was developed to provide a fast, reliable, and cost-effective method to grow epitaxial layers with uniform thickness and composition. APPLIED MATERIALS Centura Epi unit consists of two main components, a reactor chamber and a vacuum machine. The reactor chamber is a cylindrical high-vacuum chamber with a heated substrate holder, an angled gas distribution plate, and 4-6 electrode systems mounted in the upper part of the chamber. The vacuum tool creates a vacuum in the chamber by means of a combination of rough pumping, turbo pumping and cryopumping. Centura Epi asset can be operated with a wide range of process control parameters and substrates at temperatures of up to 1000°C. The deposition process is initiated in the highly evacuated reactor chamber by introducing a sequence of reactants onto the substrate holder. The process controller regulates the flow and composition of each reactant. The reactants interact over the substrate surface and create an epitaxial layer. The growth rate of the layer can be controlled both by adjusting the reactant ratios and the temperature of the substrate. In some applications, superlattices of different materials can also be formed by carefully controlling the flow of reactants. AMAT / APPLIED MATERIALS Centura Epi model offers a high deposition rate, good thickness uniformity with a low particle size, and sharp interfaces. It can also be used for thin film deposition with good material selectivity. This equipment provides good control over impurity incorporation, low surface roughness and low temperature deposition which makes it suitable for sensitive materials such as III-V Nitrides or high-K dielectrics. In addition, AMAT Centura Epi system is effective for the rapid growth of high quality epitaxial layers on substrates of various sizes. The output from this unit can be used for many applications such as high-frequency device fabrication, advanced memory flat panel displays and storage devices.