Used AMAT / APPLIED MATERIALS Centura Epi #9238130 for sale

AMAT / APPLIED MATERIALS Centura Epi
ID: 9238130
Vintage: 2006
Reactor (3) Chambers (AP / RP) 2006 vintage.
AMAT / APPLIED MATERIALS Centura Epi Reactors are gas epitaxy systems designed to operate in a pseudo-batch mode for the growth of planar, complex, or composite epitaxial layers. The epi reactor is designed for high-end epitaxial research and production in materials such as silicon, germanium, diamond, and zinc selenide. The equipment features an integrated tunable laser or optical emission spectroscopy (TLS/OES) to provide real-time monitoring of ingredients in the system and detect reaction conditions in the reactor. This enhances the performance capabilities of the unit, making it capable of high-end production, while providing accurate process control. AMAT Centura Epi Reactor is designed around AMAT Pro Series reactor design. This includes features such as a larger quartz load-lock chamber, a large processed wafer area for easier wafer manipulation and a Pyrosil plate for robust growth. The Pyrosil plate provides uniform distribution of the reactants and full exposure to the radial epitaxial burner. The Pyrosil plate is improved over the Cylindrical Reactor Design, which eliminates the hotspot effect caused by the radial burner. APPLIED MATERIALS Centura Epi Reactor also offers a dual-source quartz arc lamp for deposition on a wide range of materials, allowing for high repeatability for improved yield and process control. Besides, the unit offers a six-channel mass flow controller for precise control of gases entering the reactor, providing high-end control over the active materials in the machine. This makes it ideal for serving as an efficient research and high-yield production tool. The tool also offers a graphical user interface (GUI) and a Process Sequencer architecture, allowing users to preciously control the growth process while ensuring robust and repeatable results. In addition, the GUI allows users to easily adjust a wide range of asset settings to perfectly match the requirements of each substrate and growth process. Centura Epi Reactor is capable of high-throughput, robust and repeatable production of high-end epitaxial layers while making sure that the ingredients in the model are precisely monitored and controlled. The unit offers a comprehensive range of features to precisely control the epitaxial growth process and ensure superior results. This makes AMAT / APPLIED MATERIALS Centura Epi Reactor an ideal choice for high-end epitaxy research and production.
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