Used AMAT / APPLIED MATERIALS Centura Epi #9282867 for sale

ID: 9282867
System, 12".
AMAT / APPLIED MATERIALS Centura Epi is a type of reactor that employs a chemical vapor deposition (CVD) process to grow thin films and layers of material on substrate surfaces. The reactor is mainly used in the semiconductor and electronics industries for the depositing of dielectric and metals thin films. The reactor is designed for high throughput applications with a high degree of precision and repeatability. AMAT Centura Epi reactor is designed with an adjustable-height heated electrostatic chuck pedestal, allowing a wide range of substrate sizes and configurations to be used. An integrated facility for substrate heating and cooling is also provided to ensure repeatable processes, while the optional chilled gas option ensures precise temperature control in the chamber. An additional feature is the quartz-lined pyrex deposition chamber, which minimizes contamination of substrates and thin films. The reactor is also equipped with several in-situ monitoring devices, including a thermal conductance sensor and capacitance monitor, to provide continuous and accurate in-situ data during deposition processes. The adjustable reactive atomic flux monitor helps to optimize the thin film unreacted species and the optical density detection system allows for the evaluation of thin film adhesion and thickness. APPLIED MATERIALS Centura Epi reactor offers a high level of process automation with its built-in Epicenter platform. Epicenter is a powerful integrated process control system, which allows for remote monitoring of the deposition process and centralized control of recipes and process parameters. The platform also enables efficient recipe management, and advanced diagnostics improve process repeatability and reliability. Centura Epi is a versatile and reliable reactor that is ideal for applications ranging from semiconductor fabrication and electronics assembly to advanced thin film deposition. Its combination of precision, automation and modularity makes the reactor an excellent choice for high-volume production and research in the semiconductor and electronics industries.
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