Used AMAT / APPLIED MATERIALS Centura Epsilon / 0010-42572 #9199307 for sale

ID: 9199307
Wafer Size: 12"
Enabler chambers, 12".
AMAT / APPLIED MATERIALS Centura Epsilon / 0010-42572 is a single-wafer reactor designed to provide UV processing for compound semiconductor materials like gallium arsenide (GaAs) and indium phosphide (InP). The equipment features a patented dual-stage heating system that provides precise temperature control with high repeatability. It is equipped with an independent manifold for three UV sources; metal-halide, diode, and laser. Each source can be individually controlled and optimized for high-yield processing. The unit also features an air-cooled high-frequency power source that enables low reflected power and high power stability. It contains a temperature control structure that consists of pyrometer-controlled, closed-loop furnace and platform temperature. Additionally, the machine includes a low-vibration wafer platform and temperature exchanger to ensure uniform temperature across the wafer. The Centura Epsilon is highly flexible and user-friendly. It supports a wide range of wafer sizes and can be utilized for various UV processing applications. It also features a standard interface that allows users to integrate it into their existing processing environment. Further, an optional load port is available for automatic loading and unloading of wafers. Overall, AMAT Centura Epsilon / 0010-42572 is an advanced, high-performance single-wafer reactor designed for performing UV processing on compound semiconductor materials. It offers flexible control parameters along with precision temperature control and tuning, enabling powerful and repeatable performance.
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