Used AMAT / APPLIED MATERIALS Centura Etch #293798847 for sale
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ID: 293798847
Wafer Size: 8"
Vintage: 1999
Etcher, 8"
CIM: SECS
Gas panel: Seriplex
(2) IPS Chambers (A/B)
Mainframe
(2) Tilt-out Cassettes
HP Robot
(2) Open cassettes
VME Controller
(2) Wafer orienters
DI/O PCB Missing
1999 vintage.
AMAT / APPLIED MATERIALS Centura Etch is a highly precise semiconductor etching tool used in modern semiconductor processing. This etcher enables repeatable, precise etching of semiconductor materials. It is based on a patented combination of gas chemistries, electron beam, and advanced etch system engineering. In addition to the fundamental process of first depositing a PECVD oxide to achieve a fitted oxide mask for etching, this etcher also offers electrical biasing of the wafer to achieve better control of etch profiles and topographies. The tool has been designed to enable a wide range of wafer thicknesses and sizes with the ability to apply etch recipes between 30 and 1100 mm. The main purpose of AMAT Centura Etch tool is to etch one or more layers into a substrate to achieve precise feature geometries, including shallow trench isolation (STI) and high aspect ratio contact etching. The capability to create contact holes and tighter vias reduces wasted space in back-end-of-line applications, improving device performance and area efficiency. The etcher is also well suited for back end via etching requiring precise etch profiles and depths. Due to its high aspect ratio, the etcher is particularly useful for creating deep structures such as vias and floor planar pixels with a minimum line width as small as 30 nm. APPLIED MATERIALS Centura Etch tool is also capable of generating plasma with a durability more than a hundred times that of plasma generated by traditional gas systems. This increases reliability and reduces the cost of production and maintenance. Additionally, the tool features advanced process scalability for up to 11 process chambers for parallel wafer processing, enhancing throughput efficiency. Centura Etch also offers an advanced self-adjustment feature, which automatically adjusts the tool's parameters to ensure optimal etch performance. This feature enables high precision etching for a broad range of materials with minimum variation within batches. Additionally, the advanced monitor and control systems simplify monitoring and operation, reducing downtime for maintenance. In conclusion, AMAT / APPLIED MATERIALS Centura Etch is a highly precise, cost-effective, and reliable semiconductor etching tool that allows for repeatable precision etching of etched materials. It offers a wide range of options for scaling up production nodes to meet the high demands of both modern and emerging semiconductor applications.
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