Used AMAT / APPLIED MATERIALS Centura HDP #9066673 for sale

AMAT / APPLIED MATERIALS Centura HDP is a high-density plasma (HDP) deposition reactor, which is an industrial-grade design tool for semiconductor fabrication. It provides sophisticated processing capabilities for improved process control, performance, and yield. This reactor is capable of depositing ultra-thin films and depositing non-uniform layers without having to compromise quality. AMAT Centura HDP employs an inductively coupled plasma (ICP) which is created by applying a high frequency and high voltage, direct current magnetic field to the plasma. This enables stable and precise operation at high power levels, resulting in uniform and more efficient processing. APPLIED MATERIALS Centura HDP is designed to provide high-density and uniform deposition of extremely thin layers for high-end semiconductor processes. It offers uniformity values of less than +/- 2% over a large area and precision layer thickness control of better than 1 nanometer (nm). The reactor can also be used for a variety of etch processes, such as hard mask etching, selective dopant etc., and can be used for pulsed processes (process recipes) in order to optimize product performance. Centura HDP also provides extreme process control, with less time spent on making adjustments. The reactor utilizes advanced algorithms to optimize complexity and minimize critical settings to ensure consistent and repeatable performance. AMAT / APPLIED MATERIALS Centura HDP can also support multiple process recipes, making it flexible enough to be used for multiple different process applications. AMAT Centura HDP is a powerful and reliable plasma deposition reactor that is reliable, consistent and repeatable, and a great choice for semiconductor fabricators looking to increase their process control, performance and yield. Its high-density deposition capabilities combined with extremely precise layer thickness control makes it ideal for achieving uniformity in ultra-thin layers and for use with a wide range of etch processes.