Used AMAT / APPLIED MATERIALS Centura HDP #9142606 for sale

AMAT / APPLIED MATERIALS Centura HDP (High Density Plasma) reactor is a multi-user tool designed for semiconductor wafer processing. It is utilized in the production of a variety of high-performance integrated circuits, including advanced memory and logic devices. AMAT Centura HDP reactor is a capacitively-coupled plasma (CCP) reactor, meaning that it relies on electric fields to create and sustain a plasma over a workpiece. It is capable of running process gases such as silane (SiH4), nitrogen (N2), and argon (Ar) at pressures between 0.001 Torr and 0.2 Torr. This wide range of pressure levels allows for ideal processes for creating advanced devices that require strict process guidelines. The reactor works by creating a plasma within a chamber, which is then exposed to a wafer as it passes over the plasma. The reactor provides a high degree of control over the volume and temperature of the plasma, allowing for selective etching and deposition with precise parameters. Plasmas created with APPLIED MATERIALS Centura HDP reactor are able to process materials across multiple levels, from front to back-end and from single layer to multi-layered devices. Centura HDP reactor operates with an advanced model-based control equipment. This system allows for the optimization of process recipes through a combination of simulations, experiments, and real-time process monitoring. This unit also allows users to fine-tune the reactor's operating conditions and chamber configurations, allowing for complex process sequences. AMAT / APPLIED MATERIALS Centura HDP reactor is designed to be used in a clean-room environment and is made of UV-resistant, corrosion-resistant material, allowing it to perform reliably under high-temperature and high-vacuum conditions. Additionally, the machine is designed to reduce the use of hazardous chemicals, reducing contamination risk and lowering costs. AMAT Centura HDP reactor is an ideal tool for the production of advanced memory and logic devices, as it offers a high degree of control and flexibility, as well as reliable performance. Its multi-user capabilities and sophisticated process control tool make it an ideal tool for semiconductor fabrication, allowing for the production of high-performance devices with complex functionality.