Used AMAT / APPLIED MATERIALS Centura HDP #9163021 for sale

AMAT / APPLIED MATERIALS Centura HDP Reactors are designed for high density plasma (HDP) etch processes. These reactors feature an advanced HDP source equipment that supports high-performance etch solutions for a wide range of device types, from MEMS and RF to logic and memory. With the HDP source system, AMAT Centura HDP reactor enables finer and better control of plasma parameters, allowing for higher process throughput and improved device quality. APPLIED MATERIALS Centura HDP reactors are also designed to accommodate a wide range of process gases, such as hydrogen, helium, argon, oxygen, ozone, and nitrogen. This allows the HDP reactors to support a wide range of etch processes, such as deep RIE, etchback, and dry etch. Centura HDP reactors are also equipped with a four-port showerhead that has been optimized for HDP etching applications. This allows for efficient gas blending and uniform gas distribution under the wafer. In addition to its advanced HDP source unit and four-port showerhead design, AMAT / APPLIED MATERIALS Centura HDP reactor has a number of advanced features that enable better performance, including a thermal control machine for excellent thermal uniformity, a process monitoring tool for full feedback control, and an advanced recipe management asset. AMAT Centura HDP reactors also feature active substrate cooling, with low-mass wafers reaching cool down rates greater than 350°C/min. The reactors also feature a unique twin-blade electrode design, which minimizes particle generation and increases the etch rate. APPLIED MATERIALS Centura HDP reactors are designed to enable efficient production runs, with high levels of repeatability and reproducibility. The reactors enable high-throughput etching for process optimisation and yield increase. The reactors come with a full suite of support services and an intuitive graphical user interface for easy process set up, monitoring, and control.