Used AMAT / APPLIED MATERIALS Centura HDP #9163132 for sale

AMAT / APPLIED MATERIALS Centura HDP equipment is a high-density plasma (HDP) reactor used for etching and deposition. The HDP reactor employs a gas-based process to create a plasma-rich environment over the wafer surface in order to produce submicron structures. The system consists of a process chamber, chamber walls, process samples, RF generator, RF match network, RF power amplifier, and humidity control unit. The design of the HDP reactor is based on the well-established concept of confocal cylindrical geometry. The process chamber consists of a series of nested cylindrical coils that creates a powerful magnetic field inside the process chamber. This enables better control of the plasma because the electron and ion densities of the plasma can be manipulated throughout the chamber. The HDP unit utilizes two RF sources to generate the plasma: the RF generator, and RF match network. The RF generator provides the initial high-frequency power for the plasma and the RF match network ensures that the power is efficiently matched to the chamber walls as the power is delivered. This aids in achieving uniform deposition and etching on the substrate. The temperature inside the process chamber can also be monitored and manipulated by the RF match network in order to ensure a consistent process. The chamber walls of the HDP machine are made out of dielectric materials such as quartz and aluminum nitride in order to maximize the electrical insulation between the plasma and the chamber walls. This offers better control over the plasma and ultimately leads to more uniform deposits and etches on the substrate surface. The chamber walls are also outfitted with a peripheral heating tool which is used to control the temperature of the process chamber and ensure consistent plasma. The HDP asset also features a humidity control unit that helps maintain a consistent relative humidity (RH) level inside the process chamber. During the process, the RH inside the chamber must remain relatively stable to help prevent the formation of plasma instabilities. Overall, AMAT Centura HDP is a reliable and efficient plasma processing model. The equipment's nested cylindrical coils, RF generator, RF match network, and peripheral heating system help ensure uniform deposition and etching on the substrate, while the humidity control unit helps maintain a stable RH level inside the chamber. This helps deliver consistent results and uniform structural structures on the processed substrate, making the HDP unit ideal for submicron etching and deposition.