Used AMAT / APPLIED MATERIALS Centura HDP #9180160 for sale

AMAT / APPLIED MATERIALS Centura HDP reactor equipment is a high-definition plasma (HDP) technology which is used for semiconductor plasma etching and deposition processes. This reactor system offers two distinct advantages over conventional PECVD systems, namely high deposition rate capabilities and high conformality. AMAT Centura HDP reactor is a plasma-enhanced chemical vapor deposition (PECVD) unit. The reactor comprises of an RF generator, a reactor chamber, a substrate holder and a reactant delivery machine. The RF generator provides an 13.56 MHz of low density POWER to initiate and sustain the plasma. The Plasma is generated using C4F8 gas, which is easily controllable and adjustable to ensure a high quality HDP etch process. The reactor chamber is made of stainless steel which protects the internal components from the highly corrosive plasma environment. The substrate holder is typically constructed from quartz to shield the substrate from particle contamination and from lift-off during the deposition process. The reactant delivery tool is designed to deliver a preciously controlled mixture of reactant gases such as silane, nitrogen, or argon. APPLIED MATERIALS Centura HDP reactor can achieve extremely high deposition rates, up to 5x higher than employed by conventional PECVD systems. This is possible as a result of its unique plasma energetics and its ability to sustain high temperatures and pressures. The reactor's capability for high-speed etching and deposition gives users the ability to rapidly produce intricate structures and components with high-quality surfaces with excellent conformality. Centura HDP reactor is also equipped with advanced process control features that allow users to optimize their process performance. This asset enables users to precisely monitor process conditions such as temperature, pressure, etch rate, and deposition rate, and adjust their parameters accordingly. The model also has advanced diagnostics functions to better understand the effect of various plasma conditions and reactant gases on the resulting device. AMAT / APPLIED MATERIALS Centura HDP equipment has been successfully used in many semiconductor wafer processing applications such as etching, deposition, and cleaning. This versatile tool can also be used to manufacture nanofilaments and other advanced microstructures. Additionally, its tightly coupled system control functions makes it a perfect tool for complex industrial applications such as etching of solar cells, flat panel displays, and MEMS components.