Used AMAT / APPLIED MATERIALS Centura HDP #9188710 for sale

AMAT / APPLIED MATERIALS Centura HDP reactor is a high-density plasma (HDP) equipment designed for use in microelectronics production. The reactor is capable of extreme processing temperatures and pressure levels, enabling a wide range of applications in the microelectronics industry. The HDP system utilizes a magnetized cylindrical plasma chamber, in which a mixture of inert gas and process gas is heated and ionized using a high-power radio frequency (RF) source. The energy supplied by the RF source excites the gas particles, which in turn release their energy through recombination, forming long-lived non-thermal plasma. The plasma is then used to etch, deposit, or otherwise process a substrate of various materials with extreme accuracy. AMAT Centura HDP reactor is designed to be used in microcircuit fabrication processes and offers superior control over the process parameters, enabling higher levels of substrate performance. Its efficient cooling unit and low off-gassing enable several process options for wet cleaning, dry etching, and oxidation processes. The machine also offers several safety features that enable efficient operation in an environment with multiple operators. The advanced diagnostics tool allows for precise monitoring of the process parameters and facilitates continuous optimization. Additionally, the asset utilizes unique antenna designs for enhanced precision, as well as advanced shielding technology for reduced noise levels. APPLIED MATERIALS Centura HDP reactor produces accurate, high-performing substrates in the microelectronics fabrication process. This is made possible by its precise power control, superior process control, and low-noise operation. These features are accompanied by automated cleaning processes and closed-loop safety systems, which ensure the highest level of substrate performance is maintained. The reactor also features a user-friendly interface and several data logging functions that enable optimized results. This allows the model to be used in applications ranging from low-throughput research requirements to high-volume microelectronics production.