Used AMAT / APPLIED MATERIALS Centura HDP #9233062 for sale

ID: 9233062
Vintage: 2000
CVD System, 8" NBLL (3) Chambers STP-A2203 Turbo molecular pump ENI RF Generator 2000 vintage.
AMAT / APPLIED MATERIALS Centura HDP is a high-density plasma (HDP) etch reactor designed for semiconductor fabrication that yields device feature sizes below the 1µm critical dimension regime. The HDP equipment utilizes a thirteen-stage hydrogen-based process chamber to produce extremely uniform, small features with minimal overetch, which allows for better device performance. The reactor provides excellent process flexibility with a wide range of recipe control options, allowing it to be used for a wide range of applications such as photoresists patterning, high-k dielectrics etch and copper removal. The HDP system allows for an unconstrained, three-dimensional etching of structures, enabling the fabrication of high aspect ratio features with excellent repeatability. Furthermore, the unit is designed to reduce particle and volatile by-product emissions to maintain safe and clean operation. AMAT Centura HDP utilizes two connected components, the Endura Multi-Chamber etch machine and the transfer module. The Endura tool consists of a series of chambers, allowing for multi-level deposition, etch, and clean processes without interrupting the chain of process steps. The asset has 13 chambers, including a process chamber, cooled etch turret, quartz cold wall and reaction tube for wafer transfer. By using advanced RF power supplies, recipes can be precisely controlled to enable high density plasma technology. Furthermore, an Auto Endpoint Detection model facilitates in-situ monitoring of the process, allowing for maximum throughput with minimal maintenance. The transfer module contains a wafer transport equipment, enabling high-speed loading and unloading of wafers. The system also has a centralized wiring controller, safety interlock, and a dedicated cooling unit to ensure safe and reliable processing of wafers. Additionally, the machine is equipped with a chill plate purge station, a cool gas source, a remote computer interface, and user-defined recipes. Ultimately, APPLIED MATERIALS Centura HDP is a versatile, efficient HDP etch reactor for semiconductor processing. Its advanced features and tight control over recipes allows for production of ultra-small device features, along with minimized emissions for a safe and reliable work environment.
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