Used AMAT / APPLIED MATERIALS Centura HDP #9249365 for sale

AMAT / APPLIED MATERIALS Centura HDP
ID: 9249365
System, parts system.
AMAT / APPLIED MATERIALS Centura HDP (High-Density Plasma) reactor is a complete etch solution designed to deliver high production yields at high throughputs. This advanced reactor is capable of processing a broad range of materials such as III-V, silicon germanium, group III-B metals and their nitrides, and other compound materials. It is configured with an optimized source-drain-etch process to reduce the time of an entire etch cycle. AMAT Centura HDP is equipped with a DC RF power supply that has a higher switching frequency, as well as an MC-Plasma source for improved etch uniformity. The DC power supply also helps to achieve higher etch rate and process uniformity. Additionally, APPLIED MATERIALS Centura HDP is capable of achieving a higher level of accuracy with precision plasma etch cycles. The MC-Plasma's two-frequency, two-phase tuning configuration helps to reduce the etch time while ensuring a high level of uniformity. Centura HDP features a multi-frequency plasma source that is designed to regulate and stabilize plasma density in order to produce high accuracy etching results. It also offers an advanced closed-loop horizontal wafer transport equipment that helps to ensure high process uniformity. Its stainless steel quartz chamber helps protect the chamber surface and maintain uptime. AMAT / APPLIED MATERIALS Centura HDP is low-maintenance and highly reliable. Its built-in metrology tool measures the micro-roughness of the etch line, ensuring the most precise etching possible. Additionally, the system includes a number of processing recipes to give complete control over the etching process. The unit also comes with a GUI-based control interface that allows for fast setup, streamlined operation, and simplified valve control for quick etch parameter changes. Overall, AMAT Centura HDP is an advanced etch reactor that offers superior process capabilities with its high-density plasma source, multi-frequency plasma source, closed-loop horizontal wafer transport machine, and stainless steel quartz chamber. It is a reliable solution that increases production yields and reduces the time of an entire etch cycle. It also comes with a comprehensive GUI-based control interface and processing recipes that permit complete control over the process.
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