Used AMAT / APPLIED MATERIALS Centura HP PVD #9266126 for sale

AMAT / APPLIED MATERIALS Centura HP PVD (Physical Vapor Deposition) Reactor is a state-of-the-art reactor designed to precisely deposit full-coverage films of metals, alloys, and compounds on semiconductor wafers. This reactor features an Integrated Pulsed DC Power Source that provides flux control, improved uniformity, and reduced damage due to energetic radicals. AMAT Centura HP PVD reactor can deposit metals, silicides, dielectrics, and other materials onto wafer surfaces, giving them additional protection against corrosion and other damage. It has also been designed with additional safety features such as a robotic Arm, a shutter, a shielding gas supply system, pressure transducer with monitoring and control capabilities, and emergency shut-off valves. The reactor consists of three main sub-systems: Process Chamber, Bias Generator, and Showerhead. The Process Chamber is a quartz chamber coated with heat-transmitting pyrolytic graphite or W-C, and can be heated up to 1000° C. This chamber is loaded with up to 400 wafers, and can accommodate a variety of target materials. The Bias Generator is used to control the plasma by varying the bias voltage to the target. This generator enables uniform film deposition across all wafers in each individual batch, as well as precise layer thickness control. The Showerhead can be used to inject a shower of precursor gases or ion beams, to enable depositions of metals, alloys, and compounds at controlled rates. APPLIED MATERIALS Centura HP PVD Reactor is a highly efficient tool to deposit a wide variety of films on substrate materials. Its heat-resistant Chamber and the precisely controlled DC source enables the deposition of films at much higher rates than conventional PVD reactors, improving productivity and throughput. The wafer compatibility of this system is further expanded through its highly versatile Showerhead, and its in-situ process control and automated emergency shut-off valves enable safe and efficient operation. Centura HP PVD Reactor is a reliable and efficient tool for depositing uniform, full-coverage films, and is an excellent choice for any semiconductor fabrication facility.