Used AMAT / APPLIED MATERIALS Centura HP PVD #9276863 for sale

AMAT/AMAT / APPLIED MATERIALS Centura HP PVD reactor is a chemical vapor deposition (CVD) equipment specifically designed to provide uniform, high-performance layer deposition of a wide variety of materials. It is capable of depositing a variety of metals, including aluminum, tungsten, titanium, copper, and other alloys in a single operation or in multiple layers. The system utilizes an Innovative high-performance crucible-assisted CVD (IHPCVD) technique, which provides superior layer homogeneity and uniformity at deposition rates that are up to three times faster than traditional PVD systems. AMAT Centura HP PVD can deposit a wide range of material compositions up to layers 6mm thick, with outstanding conformality. The unit is extremely reliable and has rapid thermal cycle time for fast turnaround. It can be easily integrated into a multiple chamber machine to provide highly efficient throughput. The CVD process for APPLIED MATERIALS Centura HP PVD is powered by a gas injection-heated computer-controlled filtration tool. This asset enables the creation of a precisely-defined process atmosphere within the deposition chamber, while ensuring consistent delivery of reactant gases and accurate control of the chemical reaction. The reactant gases are introduced through a filtered gas inlet manifold located at the center of the reactor. This ensures uniform gas distribution within the process chamber, and also allows the model to adjust the reactant composition in real-time to ensure optimal distribution and deposition. A proprietary multi-zone process chamber design provides additional uniformity and control of layer thickness and composition across the substrate surface. This chamber utilizes heated walls to ensure a wide uniformity of deposition over the entire substrate area, while also providing the flexibility to 'tilt' the substrate to achieve different layer thicknesses. Additionally, an advanced layer control equipment ensures process accuracy and maximum conductivity. The furnace is equipped with a nitrogen inlet chamber that provides uniform nitrogen flow throughout the interior of the chamber, enabling the system to operate at high temperatures and pressures without compromising the safety or integrity of the chamber. Centura HP PVD is capable of depositing a wide range of material composition, thickness, geometries, and features with unmatched accuracy and high aspect ratio. The unit has a rapid thermal cycle times and batch production capabilities up to 2.2 liters which make it ideal for high-volume production. Finally, the robustness of the machine enables it to be operated in corrosive and high-temperature environments. All of these features make APPLIED MATERIALS/AMAT / APPLIED MATERIALS Centura HP PVD a reliable and high-performing deposition tool capable of delivering uniform and repeatable coatings for a variety of applications.