Used AMAT / APPLIED MATERIALS Centura I DPS #9093401 for sale

AMAT / APPLIED MATERIALS Centura I DPS (Diffusion Pressure Equipment) is an advanced semiconductor processing reactor used for advanced semiconductor applications such as Single Wafer Processing, Low/High Dielectric Etch, and Metal Deposition. AMAT Centura I DPS is designed to address the needs of the most advanced semiconductor processing applications, and can be used to create, maintain and manage a wide range of sample sizes as well as shapes in a single processing chamber. APPLIED MATERIALS Centura I DPS is a single-wafer reactor that uses a diffusion pressure system to create the necessary environment for processing while controlling the pressure and migration of materials to make the most out of the process. The unit features a high temperature range for local thermal oxidation (although it is subject to the materials used in the process and the number of devices being processed simultaneously). Centura I DPS offers a series of furnace features such as heating and cooling rates, temperature uniformity, superior wafer dies, multiple wafer loading capabilities, and numerous example sizes. The machine is capable of creating an efficiently managed atmosphere through the use of a diffusion pressure tool, which allows the user to control the movement and migration of materials. In addition, AMAT / APPLIED MATERIALS Centura I DPS also features a cooling asset that aids in reducing temperatures as quickly as possible, ensuring that the device being processed is not damaged. It is also designed with sophisticated process monitoring, allowing operators to ensure the model's environment and parameters remain within desired parameters while the process continues. AMAT Centura I DPS also features a wide variety of compatible feedstock materials that can be used with the equipment including polycrystalline rods, metal pieces, and others. With suitable feedstock materials in combination with its rapid thermal cycling, APPLIED MATERIALS Centura I DPS is an efficient and superior choice for advanced diffusion processes. In conclusion, Centura I DPS is an advanced semiconductor processing reactor optimized for single wafer processing applications. The system features a high temperature range for local thermal oxidation, a diffusion pressure unit to support the process, and a cooling machine to reduce temperatures as efficiently as possible. AMAT / APPLIED MATERIALS Centura I DPS also offers compatible feedstock materials for a variety of processes. The tool's sophisticated process monitoring ensures users the safe and reliable fabrication of microelectronics. This asset is a superior choice for any advanced semiconductor processing application.