Used AMAT / APPLIED MATERIALS Centura I MxP #9015094 for sale

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ID: 9015094
Etcher, 6" Flatform: Centura I Wafer type: flat Loadlock type: narrow body Wafer on blade detector: basic Robot type: HP Umbilicals: 25ft 1995 vintage.
AMAT / APPLIED MATERIALS Centura I MxP is a state-of-the-art reactor designed for semiconductor manufacturing. It is the industry's most reliable and efficient reactor for creating the complex layers of materials necessary for the integrated circuit production process. It provides temperature and pressure control for consistent and repeatable results each time it is used. AMAT Centura I MxP has a large substrate chamber and an interchangeable chamber head for highly uniform silicide film deposition. The chamber is equipped with a multi-gas module to provide high purity Argon, Nitrogen/Hydrogen or Hydrogen gas mixes and optimize films quality. It offers a nozzle configuration optimized for multi-gas mixing, allowing for better spatial uniformity and improved process control. The reactor is designed with a powerful, robust, and easy-to-use software package that offers exceptional control. Its intuitive interface makes it easy for users to set up and adjust parameters for optimal performance. It also provides diagnostic built-in to help ensure quality control. The powerful control system of APPLIED MATERIALS Centura I MxP ensures tight process control over temperature, pressure, and gas flows. It also features a wide dynamic range, which is ideal for substrate temperature control, allowing for rapid start-up and ramping to target conditions. The reactor's unique design allows for repeatable and consistent performance. Its robust construction also ensures its reliability in harsh environments. With its advanced safety features and easy maintenance, Centura I MxP is designed to provide superior performance and deliver reliable results.
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