Used AMAT / APPLIED MATERIALS Centura I PH2 #9227307 for sale

AMAT / APPLIED MATERIALS Centura I PH2 Reactor is a versatile tool used in the production of semiconductor and memory devices. The reactor uses a magnetically confined plasma to deposit thin films on the semiconductor substrates. AMAT Centura I PH2 is equipped with a 200MHz Powerline™ process-control management software, which is capable of controlling up to four plasma sources. The reactor chamber has a temperature range from -25°C to 40°C and its dimensions measure 14 inches (35.56 cm) in diameter and 18 inches (45.72 cm) in height. APPLIED MATERIALS Centura I PH2 Reactor uses a magnetic-confinement equipment for etching and deposition of materials onto semiconductor substrates. The system uses an integrated bank of electromagnets that generate magnetic fields that contain and modify the plasma. These fields create a stable environment and provide a uniform temperature across the substrate. This allows Centura I PH2 to maintain high levels of control during wafer processing. The chamber of AMAT / APPLIED MATERIALS Centura I PH2 Reactor is completely enclosed and chemically inert. It also has a pressurized delivery unit that is used to deliver inert gasses. This machine helps maintain uniformity of the plasma and thickness of the films deposited on the wafer surface. It also ensures that the gases used in the deposition process are not contaminated by the ambient air. AMAT Centura I PH2 Reactor is also equipped with a high-performance torch, which is used to direct the plasma towards the wafer. The torch is able to deliver an energy flux up to 4W/cm2 and is capable of processing substrates of any size up to 200mm. The torch directs the plasma to the wafer at a rate of 6m/min. APPLIED MATERIALS Centura I PH2 Reactor is one of the most advanced tools used in the fabrication of semiconductor and memory devices. It offers superior control during the deposition process and is able to deliver uniform results across the substrate. The tool is also capable of handling a wide range of materials, including metals, dielectrics, and nanomaterials.