Used AMAT / APPLIED MATERIALS Centura I #9093472 for sale

AMAT / APPLIED MATERIALS Centura I Reactor is a high-temperature, chemical vapor deposition (CVD) semiconductor processing equipment. It is designed for deposition of dielectric and conducting films on wafer substrates. AMAT Centura I reactor is a thermally-isolated box system, designed to be an efficient and reliable platform for semiconductor fabrication. APPLIED MATERIALS Centura I is equipped with a horizontal chamber and a vertical valve manifold, both of which are housed in a stainless-steel casing. The unit utilizes high-temperature process gas flows and is capable of up to 300 mbar operating pressure. Furthermore, the chamber is coated with an electron-beam-treatment-resistant layer to reduce hot spot temperatures, as well as to help minimize e-beam irradiation damage. Centura I also offers an array of innovative features and advanced process capabilities, such as intuitive software interface, integrated automatic centering, in-situ backup, and process-controlling automation features. This machine also features a real-time visualization of the process, and the ability to control gas flow and pressure levels for precise deposition control. The tool consists of a replaceable susceptor plate with highly uniform power distribution. This plate is composed of a graphite plate which is electrically heated and serves as the mounting surface for the substrate. This susceptor plate is pre-heated before the deposition process starts and ensures an even temperature distribution. The asset is equipped with a high-speed positioning model, which moves the substrate throughout the deposition cycle with a maximum homogenous speed of 10 cm/s. Additionally, the equipment can compensate for the thermally induced movements of the substrate and is equipped with a specialized locking mechanism to ensure a secure and well-distributed deposition. The system is further enhanced with an Integrated bypass flow control unit for process gas distribution. This machine enables users to create precise gas flows for precise deposition control. Additionally, the tool includes an advanced real-time optimization (RTO) module for in-situ process control and optimization. This module is designed to optimize the process parameters in real-time and provide precise and accurate deposition results. Overall, AMAT / APPLIED MATERIALS Centura I Reactor is an innovative and cutting-edge semiconductor processing asset designed for deposition of dielectric and conducting films on wafer substrates. This model is designed to provide precise deposition control, excellent uniformity and repeatability. It is also designed to ensure precise and accurate deposition results through the use of specialized features and process gases.