Used AMAT / APPLIED MATERIALS Centura II 5200 #293819421 for sale
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ID: 293819421
Wafer Size: 8"
Vintage: 2019
Metal etchers, 8"
(2) Dual wide body chambers, DPS / DTM
Usage: ~50,000 wafers run
APEX 5513 RF Generator
MKS GHW12A RF Unit
Gas set: CF₄, O₂, CHF₃, N₂, SF₆, Ar, HBr, Cl₂, C₄F₈
EBARA Pump
SBC
2019 vintage.
AMAT / APPLIED MATERIALS Centura II 5200 is a physical vapor deposition (PVD) process tool used to create ultra-thin semiconductor devices. It is an advanced industrial tool designed to contribute to high-volume production of transistors, memories and integrated circuits that require more stringent performance than other standard PVD systems. AMAT Centura II 5200 features a parallel high-vacuum chamber design with a rear-loaded robot to facilitate wafer transportation. This robot can hold one 200mm wafer or two smaller wafers at once, enabling the system to handle high-volume production. The tool comes with high-vacuum pumps, comprising a Turbomolecular pumping system and combination diffusion/scroll pumps. It is also equipped with a MultiHead Source, providing up to four sources on a planetary track that covers up to 270-degrees around the wafer in one revolution. APPLIED MATERIALS Centura II 5200 is capable of operating under a variety of chamber configurations, materials, gas and pressure conditions. It features automatic pressure control and a high-precision shutter that can ensure consistent and repeatable film thickness deposition in various gate applications. Moreover, it guarantees smooth surface finish plating with its advanced collimation and rotation control. The tool also offers advanced web monitoring software, automated wafer tracing and tool status to ensure uniform film coverage. Overall, Centura II 5200 is an advanced PVD system designed to meet quality and throughput performance requirements. It is capable of handling delicate deposition processes and creating ultra-thin semiconductor devices. With a range of features and advanced performance, AMAT / APPLIED MATERIALS Centura II 5200 enables users to achieve the highest production yields.
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