Used AMAT / APPLIED MATERIALS Centura II DPS+ #9029478 for sale

AMAT / APPLIED MATERIALS Centura II DPS+ reactor is an advanced-performance etch and deposition equipment designed to produce high-quality semiconductor devices. AMAT Centura II DPS+ provides advanced etch and deposition capabilities and is suitable for use in the production of integrated circuits such as CPUs, GPUs, and memory devices. It is optimized for use in advanced manufacturing processes such as single- and multi-subject etching, PECVD, sputtering, PVD, ALD and CVD, and can be utilized in a variety of integrated circuit fabrication applications. The system is designed for high throughput, and is capable of accommodating up to three processing chambers. It is designed to accommodate a wide range of process gases, including N2, O2, NF3, CF4, SF6, and Ar. Its wafer susceptor also enables a high wafer count at up to 150mm or 200mm. Additionally, APPLIED MATERIALS Centura II DPS+ offers a wide process window with excellent uniformity across the substrate and can be integrated with traditional etch processes such as ICP, RIE, and multi-wafer etch for improved process control. Centura II DPS+ utilizes a pressure-servo-control platform to ensure thermal management, and this feature eliminates temperature disturbances that can occur in other systems. The reactor utilizes a proprietary hot-zone technology to reduce ignition delay, and it is equipped with a built-in valves-control unit that ensures efficient wafer pre-cleaning. The reactor is built with optical cells and active cooling that enable improved power management for the machine's high-performance operations. Moreover, AMAT / APPLIED MATERIALS Centura II DPS+ is designed for easy maintenance as all consumables and spares are located on the front side of the reactor. Finally, AMAT Centura II DPS+ is equipped with a user-friendly AMAT Osmic™ software package for monitoring and controlling the tool's operations. The software allows operators to customize the asset's settings and parameters, as well as to troubleshoot issues in an efficient manner. The model provides solid out-of-the-box performance, with reliable and repeatable results obtained even with minimal operator adjustments. It also ensures a reliable chamber cleaning process with its built-in automatic cleaning sequence. In summary, APPLIED MATERIALS Centura II DPS+ is a powerful and reliable reactor that enables highly efficient production of semiconductor devices.