Used AMAT / APPLIED MATERIALS Centura II DPS+ #9174726 for sale

AMAT/AMAT / APPLIED MATERIALS Centura II DPS+ is an oxide dopant source used in the fabrication of integrated circuits. It is a single wafer vertical high-density plasma (HDPCVD) reacto that can produce a wide variety of oxide dopants. It is capable of both processing p-type dopants, such as boron, as well as n-type dopants, such as phosphorus. This reactor is well suited for applications that require an extremely consistent doping profile. AMAT Centura II DPS+ uses a radical unique sigma-net control equipment that configures its wafer processing parameters dynamically and autonomously for optimum results. This system also features an eight-gas delivery and evacuation unit that allows for independent control over source reactants, enabling highly customized doping profiles. It includes a vertical multi-zone motorized track that improves workflow efficiency, a vertical-lift gas distribution machine for gas distribution uniformity, and an improved software package for re-configuration and data collection. The reactor is also designed to provide precise deposition rate control and uniform doping, using a multi-zone variable power tool with AC plasma. The power delivery asset is designed to instantly adjust the power to each zone, enabling a highly repeatable production process. The reactor also features a temperature management model for accurate results, with heated nozzles and an embedded temperature sensor that allow for highly precise control over the deposition and diffusion process. The reactor also offers precise thickness and uniformity control, with a multi-zone dual-filter equipment accessed through an on-board UV ozone analyzer. This system helps to monitor the purity of the reactants and pinpoints immature particles that can cause contamination. It also features a self-alignment unit for accurate wafer orientation and uni-directional heated carrier gas for better uniformity. APPLIED MATERIALS Centura II DPS+ has a wide range of safety features, including a vacuum lock for complete containment within the reactor chamber and anti-reflective coatings on the optics within the radiation chamber. It also has a secure remote monitoring machine to observe the tool's status in real-time, and a logging asset to track process history and data. For maximum uptime and cost savings, the model is designed to run at optimum efficiency when multiple wafers are loaded. With all these features, APPLIED MATERIALS/Centura II DPS+ is a reliable and efficient oxide dopant source for the fabrication of integrated circuits that requires a highly consistent doping profile.