Used AMAT / APPLIED MATERIALS Centura II DPS #9182836 for sale

AMAT / APPLIED MATERIALS Centura II DPS Reactor is a variable pressure epitaxy (VPE) chamber designed to deposit III-V materials such as indium phosphide (InP) and its alloys. It features a "hot-neutral-cold" source with a temperature range of 70°C to 3000°C, making it suitable for both high-temperature and low-temperature deposition techniques. The reactor also features an advanced automatic wafer exchange equipment, making wafer loading and unloading a breeze. With a maximum susceptor size of 200mm, it can be used to deposit complex structures with a wide range of patterns. The chamber itself is 21"x26"x25" and has a maximum operating pressure of 3 Torr range. It also includes a plasma generator for nitride deposition up to 100W. An advanced gas mixing system allows for a precise control over gas consumption, allowing for highly accurate control of material dopant concentrations. The unit features an intuitive user interface that allows for easy parameter setting, and an onboard computer with a touch-screen display to view current conditions and save recipes. For deposition, AMAT Centura II DPS Reactor can use either a liquid or vapor delivery machine. The liquid delivery tool uses a metering asset and temperature controller to precisely control material flow. The vapor delivery model features heated delivery lines and pumps that keep the materials at the desired temperature. APPLIED MATERIALS Centura II DPS Reactor also features advanced safety systems, including a quick-release equipment to evacuate the chamber before accidental pressure spikes and a built-in fire suppression system. With its combination of advanced systems, Centura II DPS Reactor is an excellent choice for complex deposition tasks.