Used AMAT / APPLIED MATERIALS Centura II DPS+ #9358593 for sale

AMAT / APPLIED MATERIALS Centura II DPS+ is a versatile deep ultraviolet (DUV) photoresist processing reactor designed for semiconductor device fabrication. It is capable of processing multiple photoresist layers simultaneously with very high precision and throughput. The reactor has advanced wafer-handling automation, enabling it to meet the increasingly stringent production demands for low-k1 and low-Dk photoresists. The source of the DUV radiation is a 350W deuterium lamp and a reflector. The reflector is designed to optimize the dose of DUV radiation produced with a single-mode beam. The radiation is directed at the sample wafers held up in the reactor's susceptor. The susceptor is heated to a uniform temperature by the lamp and the temperature is then adjusted to match the photoresists used during processing. The reactor also features an advanced wafer-handling mechanism with a three-stage chucking system that ensures high process uniformity. This system also includes a vacuum chuck for easy loading and unloading. The reactor has three independent electrostatic clamps that hold the sample in place ensuring reproducible and repeatable processes. The reactor features a reactive gas delivery system with pressures up to 100 mTorr, enabling low k1 and low Dk irradiation. The reactor also features a low thermal budget that improves uniformity and throughput. It is equipped with a temperature controller which regulates the susceptor to ± 1°C. The susceptor temperature is measured via an in-built thermal array. Additionally, the reactor has a cleaning station which is used routinely to purge the reactor from contaminants after each process. AMAT Centura II DPS+ is an ideal choice for any high-quality, high-precision photoresist processing needs. It is well-suited for usage in complex processes , such as the fabrication of low-k1 and low-Dk materials. As such, it is an excellent choice for cutting-edge semiconductor device research and fabrication.